Research and Development Status of Calcium Fluoride Crystals Used in Lithography System

Journal of Inorganic Materials

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Research and Development Status of Calcium Fluoride Crystals Used in Lithography System

DONG Yong-Jun; ZHOU Guo-Qing; YANG Wei-Qiao; SU Liang-Bi; XU Jun

Shanghai Institute of Optics and Fine Mechanics; Chinese Academy of Sciences; Shanghai 201800; China

Received:2003-03-28 Revised:2005-05-30 Published:2004-05-20 Online:2004-05-20

Abstract

Abstract: The reasons why calcium fluoride crystals can be used in lithography system were explaned. The research and development status of calcium fluoride crystals was summarized. Meanwhile the important problems need to be resolved in the process and measures that should be taken into consideration were pointed out. In the end the development foreground was expected.

Key words: calcium fluoride, crystal, UV, lithography, semiconductor

CLC Number:

O782

DONG Yong-Jun,ZHOU Guo-Qing,YANG Wei-Qiao,SU Liang-Bi,XU Jun. Research and Development Status of Calcium Fluoride Crystals Used in Lithography System[J]. Journal of Inorganic Materials.

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Research and Development Status of Calcium Fluoride Crystals Used in Lithography System

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