无机材料学报 ›› 2021, Vol. 36 ›› Issue (10): 1022-1030.DOI: 10.15541/jim20210074 CSTR: 32189.14.10.15541/jim20210074
所属专题: 【虚拟专辑】新型材料表征技术(2020~2021)
夏芳芳1(
), 王发坤1, 胡海龙2, 许翔1, 李阳1, 翟天佑1(
)
收稿日期:2021-02-05
修回日期:2021-03-26
出版日期:2021-10-20
网络出版日期:2021-06-01
通讯作者:
翟天佑, 教授. E-mail: zhaity@hust.edu.cn
作者简介:夏芳芳(1986-), 女, 工程师. E-mail: xiafangfang@hust.edu.cn
基金资助:
XIA Fangfang1(
), WANG Fakun1, HU Hailong2, XU Xiang1, LI Yang1, ZHAI Tianyou1(
)
Received:2021-02-05
Revised:2021-03-26
Published:2021-10-20
Online:2021-06-01
Contact:
ZHAI Tianyou, professor. E-mail: zhaity@hust.edu.cn
About author:XIA Fangfang(1986-), female, engineer. E-mail: xiafangfang@hust.edu.cn
Supported by:摘要:
二次谐波作为非线性光学的重要分支, 逐渐成为表征晶体结构的重要手段之一。在众多表征方法中, 二次谐波因其无损检测、高稳定性、可调谐性、超快响应、偏振敏感性、通用性、操作简单等特点被广泛应用于二维材料结构表征, 为二维材料的物性研究和功能应用提供了重要信息, 大大推动了二维材料基础研究的快速发展。本文综述了近几年二次谐波在二维材料结构表征中的研究, 简述了二次谐波产生原理, 介绍了飞秒激光器接入共聚焦拉曼光谱仪产生二次谐波测试装置, 分别讨论了二次谐波在二维材料的层间堆垛层数、层间堆垛角度、单层二维材料晶界及晶体取向表征方面的应用。同时, 本文还介绍了采用二次谐波强度直接、灵敏地检测晶体中应变幅度以及通过二次谐波信号变化跟踪材料中的缺陷变化, 接着讨论了二次谐波与拉曼光谱、光致发光的多维度关联分析在材料全面深度表征方面的重要性。最后展望了二次谐波未来在材料结构表征中的潜在研究方向。
中图分类号:
夏芳芳, 王发坤, 胡海龙, 许翔, 李阳, 翟天佑. 二次谐波在二维材料结构表征中的应用[J]. 无机材料学报, 2021, 36(10): 1022-1030.
XIA Fangfang, WANG Fakun, HU Hailong, XU Xiang, LI Yang, ZHAI Tianyou. Application of Second Harmonic Generation in Characterization of 2D Materials[J]. Journal of Inorganic Materials, 2021, 36(10): 1022-1030.
图3 二次谐波表征不同堆垛层数的二维层状晶体
Fig. 3 Characterization of 2D layered crystals with different stacking layers by SHG (a) Side view and top view of atomic structure illustration of typical layered WS2 with 2H and 3R stacking; (b-c) Optical images of 2H and 3R phase WS2; (d-e) SHG intensity of 2H and 3R phase WS2 as a function of layer numbers[40]; (f) SHG intensity of 2H and 3R phase MoS2 as a function of layer numbers[41]
图4 二次谐波表征层间堆垛角度
Fig. 4 Characterization of stacking angle between layers by SHG (a) Schematic of SHG process in second harmonic generation of bilayer thin film; (b) Atomic structure of artificially stacked bilayer; (c-d) Optical images for stacked bilayers with different stacking angles and their corresponding SH intensities[42]
图5 二次谐波表征二维材料晶界及晶体取向
Fig. 5 Characterization of the grain boundary and crystal orientation of two-dimensional materials by SHG (a-b) Optical image and SHG image of a polycrystalline monolayer of MoS2 of the same area; (c) Polarized-SHG image showing the crystal orientations[43]; (d) Dark-field SHG imaging of a monolayer MoSe2[44]
图6 二次谐波表征晶界及晶粒的形成机理
Fig. 6 Characterization of the grain boundary by SHG and analysis of grain formation mechanism (a) Optical image and SHG mapping of the flake with boundary; Inset: illustration of the two edges growth at the boundary; (c) Illustration of the armchair directions of the two grains[24]
图7 二次谐波表征二维材料应变
Fig. 7 Characterization of the strain of 2D materials by SHG (a) Schematic of strain apparatus and SHG process in monolayer MoSe2 under uniaxial tensile strain; (b) SHG spectra under different strain; (c) Evolution of normalized SHG intensity with strain[46]; (d, e) Schematic illustration of two-point bending method and SHG patterns for applied tensile strains of 0.1%, 0.5%, and 0.95%[47]
图8 二次谐波表征二维材料的缺陷
Fig. 8 Characterization of the defects of 2D materials by SHG (a-c) Optical image, fluorescence image and second harmonic mapping image of monolayer WS2[51]
图9 二次谐波与光致发光、拉曼光谱联合表征二维材料(MoS2/WS2异质结)
Fig. 9 Characterization of 2D materials (MoS2/WS2 heterojunction) by SHG combined with photoluminescence and Raman spectroscopy (a) Atomic structure diagram; (b-c) Optical image and TEM image; (d, g) SHG intensity and mapping; (e, h) photoluminescence spectra at different positions; (f, i) Corresponding Raman spectra[52]
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