Journal of Inorganic Materials ›› 2011, Vol. 26 ›› Issue (11): 1227-1232.DOI: 10.3724/SP.J.1077.2011.11299

• Research Letter • Previous Articles    

Microstructure and Electrical Properties of PMN-PT Thin Films Prepared by Oxygen Plasma Assisted Pulsed Laser Deposition

HE Yong1, 2, LI Xiao-Min1, GAO Xiang-Dong1, 2, LENG Xue1, 2, WANG Wei1, 2   

  1. (1. State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China; 2. Graduate University of the Chinese Academy of Sciences, Beijing 100049, China)
  • Received:2011-05-17 Revised:2011-06-13 Published:2011-11-20 Online:2011-11-11
  • About author:HE Yong(1982-), male, candidate of PhD. E-mail:heyong@student.sic.ac.cn
  • Supported by:

    National Basic Research Program of China (973 Program) (2009CB623304); National Natural Science Foundation of China (11090332)

Abstract: Lead magnesium niobate-lead titanate (PMN-PT) ferroelectric thin films with composition near the morphotropic phase boundary (MPB) were deposited on Si substrate by oxygen plasma assisted pulsed laser deposition (PLD). Highly (001)-oriented PMN-PT thin films with lower oxygen defect and higher crystalline property were obtained. The results show that the microstructure and electrical properties of PMN-PT thin films strongly depend on the partial pressure and the activity of oxygen in the deposition process. With the use of oxygen plasma, the dielectric constant of the PMN-PT thin film is increased from 1484 to 3012, the remnant polarization (2Pr) changes from 18 μC/cm2 to 38 μC/cm2.

Key words: pulse laser deposition, PMN-PT thin films, microstructure, electrical properties

CLC Number: