Journal of Inorganic Materials

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Deposition Conditions for CVD Diamond Films under Low Pressure with Nitrogen Addition

LIU Zhi-Jie; ZHANG Wei; ZHANG Jian-Yun; WAN Yong-Zhong; WANG Ji-Tan   

  1. Dapt. of electronic engineering; CVD lab.; Fudan University Shanghai 200433 China
  • Received:1998-02-27 Revised:1998-03-24 Published:1999-02-20 Online:1999-02-20

Abstract: Non-equilibrium stationary phase diagrams for diamond growth with nitrogen addition into the reaction system were calculated and coordinate
well with published experimental results. Therefore they can direct the experimental research on the subject. The effects of nitrogen addition on
the deposition of diamond films were discussed by using the phase diagrams. The nitrogen addition can accelerate the deposition rate of diamond films
in two aspects: enhance the CH3 concentration at the growth surface and accelerate the abstraction of H atoms covered the growth surface sites.

Key words: diamond, phase diagram, chemical vapor deposition, nitrogen, film

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