Nano-structured WO3 Thin Films Deposited by Glancing Angle Magnetron Sputtering

doi:10.15541/jim20180130

Abstract

Abstract:

Nano-structured tungsten oxide (WO₃) thin films were deposited at room temperature by glancing angle reactive magnetron sputtering and then annealed at 450℃ in air. The films were characterized by field-emission scanning electron microscope (FE-SEM) and X-ray diffraction (XRD). The WO₃ thin film deposited by DC magnetron sputtering at 80° glancing angle exhibited oblique nano-column structure, while deposited by pulsed DC magnetron sputtering at the same angle exhibits nano-pore structure. After annealing at 450℃ for 3 h, the oblique nanocolums are conjunct with each other but the nano-pore structured remains with bigger pore size. XRD analysis reveals that WO₃thin films deposited at room temperature demonstrate amorphous structure. The amorphous structure will transfers to monoclinic phase after annealing at 450℃ for 1 h. Transmittance difference between colorization and bleaching of nano-structured WO₃ thin film reaches 60% at wavelength of 600 nm. Electrochromic properties of nano-structured WO₃thin films are highly reversible.

Key words: WO₃ thin films, nano-structured, glancing angle, magnetron sputtering

CLC Number:

TB34

WANG Mei-Han, WEN Jia-Xing, CHEN Yun, LEI Hao. Nano-structured WO₃ Thin Films Deposited by Glancing Angle Magnetron Sputtering[J]. Journal of Inorganic Materials, 2018, 33(12): 1303-1308.

Figures/Tables 8

Fig. 1 Schematic diagram of glancing angle magnetron sputtering of WO3 thin films[22]

Fig. 2 Surface and cross-section images of WO3 thin films deposited by DC magnetron sputtering at 0 and 80° glancing angles Surface (a) and cross-section(b) images, deposited at 0 glancing angle; Surface (c) and cross-section (d) images, deposited at 80° glancing angle

Fig. 3 XRD patterns of WO3 film deposited by DC magnetron sputtering at 80° glancing angle(a) As-deposited; (b) After annealing at 450℃ for 1 h; (c) After annealing at 450℃ for 3 h

Fig. 4 Surface (a) and cross-section (b) images of WO3 films deposited by DC magnetron sputtering at 80° glancing angles after annealing at 450℃ for 3 h

Fig. 5 Surface morphologies of WO3 films deposited by pulsed DC magnetron sputtering at different glancing angles

Fig. 6 Surface and cross-section images of WO3 films deposited by pulsed DC magnetron sputtering at 80o glancing angles(a,b) as-deposited; (c,d) after annealing at 450℃ for 1 h; (e,f) after annealing at 450℃ for 3 h

Fig. 7 Transmittance spectra of colorization/bleaching states of WO3 film deposited by DC magnetron sputtering at 0 and 80° glancing angles

Fig. 8 Transmittance spectra of colorization/bleaching states of WO3 film deposited by pulsed DC magnetron sputtering at 80° glancing angle

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Nano-structured WO₃ Thin Films Deposited by Glancing Angle Magnetron Sputtering

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