Journal of Inorganic Materials

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Reactive Sputter Deposition of nc-TiN/a-Si3N4 Nanocomposite Films in a Magnetized Inductively Coupled Plasma

FAN Qiu-Lin; ZHAO Hong-Yu; SONG Li-Xin; ZHANG Tao; HU Xing-Fang   

  1. Shanghai Institute of Ceramics; Chinese Academy of Sciences; Shanghai 200050; China
  • Received:2003-08-20 Revised:2003-10-17 Published:2004-09-20 Online:2004-09-20

Abstract: A novel magnetized plasma CVD and PVD combined technique was developed aiming at synthesizing nanocomposite
films. The nanocrystalline nc-TiN/amorphous a-Si3N4 nanocomposite film was satisfactorily fabricated onto silicon wafer
substrates by reactively sputtering a TiSi alloyed target in a magnetized inductively coupled radio-frequency argon/nitrogen plasma.
Scanning electron microscopy (SEM), X-ray diffractometry (XRD), X-ray photoelectron spectroscopy (XPS) and high-resolution transmission electron
microscopy (HRTEM) were utilized to characterize the film structurally and compositionally. XRD, XPS and HRTEM investigations evidently revealed that
the film was nanocomposite consisting basically of ~3nm TiN nanocrystallites in an amorphous Si3N4 matrix.

Key words: nanocomposite films, magnetized plasma, titanium nitride, silicon nitride

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