[1] Ohzuku T, Ueda A, Yamamoto N. J. Electrochem. Soc., 1995, 142 (5): 1431--1435. [2] Panero S, Satolli D, Salomon M, et al. Electrochem. Commun., 2000, 2: 810--813. [3] Ferg E, Gummow R J, de Kock A. J. Electrochem. Soc., 1994, 141 (11): L147--L150. [4] Zaghib K, Simoneau M, Armand M, et al. J. Power Sources, 1999, 81-82: 300--305. [5] Wang G X, Bradhurst D H, Dou S X, et al. J. Power Sources, 1999, 83: 156--161. [6] Bach S, Pereira-Ramos J P, Baffier N. J. Power Sources, 1999, 81-82: 273--276. [7] Jansen A N, Kahaian A J, Kepler K D, et al. J. Power Sources, 1999, 81-82: 902--905. [8] Amaucci G G, Badway F, Pasquier A Du, et al. J. Electrochem. Soc., 2001, 148 (8): A930--A939. [9] Pasquier A Du, Plitz I, Gural J, et al. J. Power Sources, 2003, 113: 62--71. [10] Harrison M R, Edwards P P, Goodenough J B. Philos. Mag. B, 1985, 52: 679--699. [11] Colbow K M, Dahn J R, Haering R R. J. Power Sources, 1989, 26: 397--402. [12] 高玲, 仇卫华, 赵海雷. 北京科技大学学报, 2005, 27 (1): 82--85. [13] Chen C, Spears M, Wondre F, et al. J. Crystal Growth, 2003, 250: 139--145. [14] 杨建文, 钟 晖, 钟海云, 等. 过程工程学报, 2005, 5 (2): 170--174. [15] Kavan L, Kratochvilov\acuteaK, Gratzel M. J. Electroanal. Chem., 1995, 394: 93--102. [16] Kavan L, Fattakhova D, Krtil P. J. Electrochem. Soc., 1999, 146: 1375--1379. |