无机材料学报

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α-Ti3O5薄膜的制备及氧敏性能的研究

郑嘹赢1; 李国荣1; 殷庆瑞1; 徐廷献2   

  1. 1. 中国科学院上海硅酸盐研究所, 上海 200050; 2. 天津大学材料学院, 天津 300072
  • 收稿日期:1900-01-01 修回日期:1900-01-01 出版日期:2002-11-20 网络出版日期:2002-11-20

Preparation and Oxygen Sensing Properties of α-Ti3O5 Thin Films

ZHENG Liao-Ying1; LI Guo-Rong1; XU Ting-Xian2; YIN Qing-Rui1   

  1. 1. Laboratory of functional Inorganic Materials; Shanghai Institute of Ceramics; Chinese Academy of Sciences; Shanghai 200050; China; 2. School of Materials and Engineering; Tianjin University; Tianjin 300072; China
  • Received:1900-01-01 Revised:1900-01-01 Published:2002-11-20 Online:2002-11-20

摘要: α-Ti3O5是TiOx材料中相对较稳定的晶型,是一种潜在的氧敏材料.与传统的TiO2、ZrO2材料相比,具有阻温特性好的优点.本文通过H2还原TiO2来制备α-Ti3O5薄膜,研究了不同还原温度和保温时间对薄膜晶相组成的影响以及薄膜的导电性、电阻-温度稳定性和在氧化气氛中的晶格稳定性.同时对α-Ti3O5薄膜的氧敏性能进行了初步研究.

关键词: Ti3O5, 薄膜, 还原, 氧敏

Abstract: The preparation and oxygen-sensing properties of α-Ti3O5 films were studied. The results of testing show that the Ti3O5 film with orthorhombic structure (α phase) can be obtained by reduction TiO2 thin films in H2 atmosphere. The α-Ti3O5 film is stable up to 650℃ in air. It has low resistance-temperature coefficient and certain oxygen-sensing properties, but its oxygen-sensing properties need further improvement.

Key words: α-Ti3O5, film, reduction, oxygen sensing

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