无机材料学报

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化学气相沉积法ZnS块材料的生长

憨勇+; 郑修麟; 刘正堂   

  1. +西安交通大学材料科学与工程学院; 西安710049; 西北工业大学材料科学与工程系, 西安
  • 收稿日期:1996-04-01 修回日期:1996-06-07 出版日期:1997-06-20 网络出版日期:1997-06-20

The Crystal Growth of Chemical Vapor Deposition zinc sulphide Bulk Materials

HAN Yong+; ZHENG Xiulin; LIU Zhengtang   

  1. +School of Materials Science and Engineering; Xi an Jiaotong University Xi an 710049 China; Department of Materials Science and Engineering; Northwestern Polytechnical UniversitgXifan China
  • Received:1996-04-01 Revised:1996-06-07 Published:1997-06-20 Online:1997-06-20

摘要: 本文用化学气相沉积法制备了ZnS薄膜和块材料;观察了ZnS在具有不同表面粗糙度的石墨和石英基体上的成核和长大行为;研究了沉积温度、H2S和Zn蒸汽流量对ZnS生长速率的影响规律.

关键词: 化学气相沉积, ZnS, 晶体生长

Abstract: The film and bulk material of zinc sulphide were prepared by chemical vapor deposition. The nucleation and the growth of zinc sulphide crystals deposited on the graphite and quartz substrates withdifferent roughness were observed. The grAlNs of zinc sulphide deposited on the substrate surface are veryfine, with equiaoxial shape, and then grow up into columnar shape. The roughness of the substrate surfaceinfluences the nucleation density of zinc sulphide but has no effect on the growth rate of zinc sulphide increases with increasing the flow of H2S and vapoured Zn. The growth rate exhibits maxium value at a given deposition temperature.

Key words: chemical vapor deposition, zinc sulphide, crystal growth