Journal of Inorganic Materials ›› 2015, Vol. 30 ›› Issue (3): 225-232.DOI: 10.15541/jim20140346
• Orginal Article • Next Articles
FAN Long, LI Yu-Kun, CHEN Tao, LI Jin, YANG Zhi-Wen, YUAN Zheng, DENG Bo, CAO Zhu-Rong, HU Xin
Received:2014-07-02
Revised:2014-09-03
Published:2015-03-20
Online:2015-03-06
Supported by:CLC Number:
FAN Long, LI Yu-Kun, CHEN Tao, LI Jin, YANG Zhi-Wen, YUAN Zheng, DENG Bo, CAO Zhu-Rong, HU Xin. Recent Progress in Research on CsI Thin Film Photocathodes[J]. Journal of Inorganic Materials, 2015, 30(3): 225-232.
Fig. 2 (a) SEM image of the CsI/ MgO/ MWCNTs/ Si photocathode[45]; (b) SEM image of the Si substrate patterned by colloidal lithography after lift-off process; (c)AFM image of the fresh CsI film evaporated on the Si patterned substrate; (d) AFM image of the CsI film on the Si patterned substrate exposed to ambient air for 24 h[41]
Fig. 3 SEM images of as-deposited (a), aged in ambient air (b) and extreme moisture exposed CsI films (c)[49]; Percent degradation in the yield signal of streak camera used at NIF from a 200 nm thick CsI cathode as a function of air exposure time[47]
Fig. 4 (a) AFM image of the 5 d UV-irradiated CsI photocathode[11]; (b) PEEM image of the 5 d UV-irradiated CsI photocathode[11]; (c) TEM image of the UV-irradiated CsI film[48]
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