无机材料学报

• 研究论文 •    下一篇

碳化硅表面改性和光学镜面加工的研究现状

刘桂玲1,2, 黄政仁1, 刘学建1, 董绍明1, 江东亮1   

  1. (1. 中国科学院上海硅酸盐研究所结构陶瓷工程中心, 上海 200050; 2. 中国科学院研究生院, 北京 100049)
  • 收稿日期:2006-09-20 修回日期:2006-11-16 出版日期:2007-09-20 网络出版日期:2007-09-20

Recent Developments of Surface Coatings and Optical Fabrication of Silicon Carbide

LIU Gui-Ling1,2, HUANG Zheng-Ren1, LIU Xue-Jian1, DONG Shao-Ming1, JIANG Dong-Liang1   

  1. (1. Structural Ceramics Engineering Center of Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China; 2. Graduate University of the Chinese Academy of Sciences, Beijing 100049, China)
  • Received:2006-09-20 Revised:2006-11-16 Published:2007-09-20 Online:2007-09-20

摘要: 为了获得满足光学应用要求的碳化硅光学镜面, 通常采取碳化硅表面改性和改进光学镜面加工的方法. 碳化硅表面改性的主要方式是在碳化硅表面镀致密化涂层. 本文介绍了在碳化硅表面化学气相沉积碳化硅和物理气相沉积硅两种碳化硅表面改性技术, 并对碳化硅光学镜面加工的研究现状进行了综述.

关键词: 碳化硅, 表面改性, 光学镜面加工

Abstract: Surface coating and exploring new fabrication methods are two kinds of ordinary processes to achieve the fine optical surface of silicon carbide. Two main coating techniques of silicon carbide-based materials, CVD SiC and PVD Si on SiC surface are introduced, and the recent developments of silicon carbide optical fabrication methods are reviewed in detail.

Key words: silicon carbide, surface coatings, optical fabrication

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