无机材料学报

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硼镓共掺氧化锌透明电极制备及性能优化

蒋圣楠1,2, 郑重3, 何唯一1,2, 刘涛1,4, 潘秀红1, 陈锟1, 郭辉3, 高攀5, 刘春俊6, 刘学超1   

  1. 1.中国科学院 上海硅酸盐研究所,功能晶体与器件全国重点实验室,上海 201899;
    2.中国科学院大学 材料科学与光电技术学院, 北京 100049;
    3.西安电子科技大学 微电子学院, 西安 710071;
    4.上海大学 微电子学院,上海 200444;
    5.上海电机学院 材料学院,上海 201306;
    6.北京天科合达半导体股份有限公司,北京 102629
  • 收稿日期:2025-06-29 修回日期:2025-07-18
  • 通讯作者: 刘学超, 研究员. E-mail: xcliu@mail.sic.ac.cn
  • 作者简介:蒋圣楠(2001-), 男, 硕士研究生. E-mail: jiangshengnan23@mails.ucas.ac.cn
  • 基金资助:
    国家重点研发计划(2021YFA0716304 & 2022YFF0504600); 中国载人航天空间应用系统项目(KJZ-YY-NCL403, KJZ-YY-NCL-1-10, and KJZ-YY-NCL01)

Preparation and Performance Optimization of Boron-Gallium Co-doped Zinc Oxide Transparent Electrodes

JIANG Shengnan1,2, ZHENG Zhong3, HE Weiyi1,2, LIU Tao1,4, PAN Xiuhong1, CHEN Kun1, GUO Hui3, GAO Pan5, LIU Chunjun6, LIU Xuechao1   

  1. 1. State Key Laboratory of Functional Crystals and Devices, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 201899, China;
    2. College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 100049, China;
    3. School of Microelectronics, Xidian University, Xi’an 710071, China;
    4. School of Microelectronics, Shanghai University, Shanghai 200444, China;
    5. School of Materials, Shanghai Dianji University, Shanghai 201306, China;
    6. Tankeblue Semiconductor Co.,Ltd, Beijing 102629, China
  • Received:2025-06-29 Revised:2025-07-18
  • Contact: LIU Xuechao, professor. E-mail: xcliu@mail.sic.ac.cn
  • About author:JIANG Shengnan (2001-), male, Master candidate. E-mail: jiangshengnan23@mails.ucas.ac.cn
  • Supported by:
    National Key Research and Development Program of China (2021YFA0716304); The Space Application System of China Manned Space Program (KJZ-YY-NCL403, KJZ-YY-NCL406, KJZ-YY-NCL01)

摘要: 碳化硅光导开关是一类基于超快脉冲激光调控半导体电阻率实现导通与关断的光电器件,在脉冲功率系统、介质壁加速器系统、超快电子学等领域具有广阔的应用前景。透明氧化物导电薄膜因其优异的透光性和导电性,在光电器件透明电极领域具有重要应用价值。本研究采用磁控溅射法制备硼镓共掺氧化锌(Boron-gallium co-doped zinc oxide, BGZO)薄膜,系统研究了退火温度(300-600 ℃)对薄膜结构与性能的调控规律。XRD与霍尔效应测试结果表明,400 ℃退火处理的薄膜呈现最优的结晶质量与光、电学性能,其可见光波段透过率达93%,电阻率低至2.78×10⁻2 Ω·cm。作为应用验证,将优化后的BGZO薄膜作为透明电极集成至碳化硅光导开关器件。对比实验显示:在532 nm、170 mJ脉冲激光连续触发条件下,BGZO基器件较传统Ni基电极表现出更稳定的工作特性,其界面丝状电流损伤减少,电极边缘电场分布均匀性提升。本研究为高性能透明导电薄膜的制备提供了优化方案,并证实了其在光导开关器件中的应用优势。

关键词: 硼镓共掺氧化锌, 透明电极, 碳化硅, 光导开关

Abstract: Silicon carbide (SiC) photoconductive semiconductor switches (PCSS) are optoelectronic devices that utilize ultrafast pulsed lasers to modulate semiconductor resistivity for switching operations, demonstrating broad application prospects in pulsed power systems, Dielectric Wall Accelerator and ultrafast electronics. Transparent conductive oxide films exhibit significant potential for optoelectronic transparent electrodes due to their excellent optical transparency and electrical conductivity. In this study, boron-gallium co-doped zinc oxide (BGZO) thin films were prepared by magnetron sputtering, and the effects of annealing temperature (300-600 ℃) on their structural and electrical properties were systematically investigated. XRD and Hall effect measurements revealed that films annealed at 400 ℃ exhibited optimal crystallinity and electrical performance, achieving a visible-light transmittance of 93% and a resistivity as low as 2.78 × 10⁻² Ω·cm. As a practical demonstration, the optimized BGZO films were integrated as transparent electrodes into SiC PCSS devices. Comparative experiments showed that under 532 nm, 170 mJ pulsed laser excitation, the BGZO-based devices exhibited more stable operation than conventional Ni-based electrodes, with reduced filamentary current damage at the SiC-electrode interface and improved electric field uniformity at the electrode edges. This study provides an optimized fabrication strategy for high-performance transparent conductive films and confirms their advantages in photoconductive switch applications.

Key words: boron-gallium co-doped zinc oxide, transparent electrodes, silicon carbide, photoconductive switch

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