Abstract: ZrW₂O₈ thin films were deposited on quartz substrates by pulsed laser deposition method. Effects of substrate temperature on the microstructure, composition, surface roughness and morphology of the ZrW₂O₈ thin films were observed by X-ray diffraction (XRD) and atomic force microscope (AFM). The thickness and optical transmittance of the ZrW₂O₈ thin films were measured by surface profilometer and spectrophotometer respectively. The negative thermal expansion property of the ZrW2O8 thin film was measured by high temperature X-ray diffraction. The results indicate that the as-deposited ZrW₂O₈ thin films deposited at the substrate temperature of room temperature, 550℃ and 650℃ are amorphous phase, and the cubic ZrW₂O₈ thin film can be obtained after annealing at 1200 ℃ for 3 min and then quenching in water. With the increase of deposition temperature, the surface roughness decreases markedly. The optical transmittances of the ZrW₂O₈ thin films prepared at different condition are about 80%, and the negative thermal expansion coefficient of the resulting cubic ZrW₂O₈ thin film is -11.378×10^-6 K^-1 in the temperature range from 20℃ to 600℃.

Key words: ZrW₂O₈, thin film, pulsed laser deposition, negative thermal expansion, transmittance