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无机材料学报

• 研究论文 •    下一篇

光刻系统用氟化钙晶体的研究进展

董永军; 周国清; 杨卫桥; 苏良碧; 徐军   

  1. 中国科学院上海光学精密机械研究所 上海201800
  • 收稿日期:2003-03-28 修回日期:2005-05-30 出版日期:2004-05-20 网络出版日期:2004-05-20

Research and Development Status of Calcium Fluoride Crystals Used in Lithography System

DONG Yong-Jun; ZHOU Guo-Qing; YANG Wei-Qiao; SU Liang-Bi; XU Jun   

  1. Shanghai Institute of Optics and Fine Mechanics; Chinese Academy of Sciences; Shanghai 201800; China
  • Received:2003-03-28 Revised:2005-05-30 Published:2004-05-20 Online:2004-05-20

PDF (PC)

3185

被引次数

11

摘要： 解释了氟化钙晶体能被应用在光刻系统和掀起研究热潮的原因,概述了氟化钙晶体的研究和发展现状,指出了目前氟化钙晶体在研究和发展过程中要解决的重要问题和措施,最后对氟化钙晶体在光刻系统中的发展前景作了展望.

关键词: 氟化钙, 晶体, 紫外, 光刻, 157nm, 半导体

Abstract: The reasons why calcium fluoride crystals can be used in lithography system were explaned. The research and development status of calcium fluoride crystals was summarized. Meanwhile the important problems need to be resolved in the process and measures that should be taken into consideration were pointed out. In the end the development foreground was expected.

Key words: calcium fluoride, crystal, UV, lithography, semiconductor

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