退火温度对 a-C:H 膜结构及摩擦学性能的影响

doi:10.3724/SP.J.1077.2011.00209

无机材料学报 ›› 2011, Vol. 26 ›› Issue (2): 209-213.DOI: 10.3724/SP.J.1077.2011.00209 CSTR: 32189.14.SP.J.1077.2011.00209

退火温度对 a-C:H 膜结构及摩擦学性能的影响

王永霞¹,², 冶银平¹, 李红轩¹, 吉利¹, 陈建敏¹, 周惠娣¹

1. 中国科学院兰州化学物理研究所固体润滑国家重点实验室, 兰州730000; 2. 中国科学院研究生院, 北京100049

收稿日期:2010-05-05 修回日期:2010-06-06 出版日期:2011-02-20 网络出版日期:2011-01-21
作者简介:王永霞(1986-), 女, 硕士研究生. E-mail: yxwang108@163.com
基金资助:
国家自然科学基金(50705093);中国科学院创新群体基金(50421502)

Effect of Annealing Temperature on the Structure andTribological Propertyof a-C:H Film

WANG Yong-Xia¹,², YE Yin-Ping¹, LIHong-Xuan¹, JI Li¹, CHEN Jian-Min¹, ZHOU Hui-Di¹

1. State Key Laboratory of Solid Lubrication,Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou730000, China; 2. Graduate University of Chinese Academy of Sciences, Beijing100049, China

Received:2010-05-05 Revised:2010-06-06 Published:2011-02-20 Online:2011-01-21
Supported by:
National Natural Science Foundation of China ( 50705093 ); Innovative Group Foundation from NSFC ( 50421502 )

摘要/Abstract

摘要： 为研究环境温度对含氢无定形碳(a-C:H)膜结构和性能的影响, 将a-C:H膜在大气环境中进行高温退火处理,并借助红外光谱、拉曼光谱、X射线光电子能谱、3D表面分析仪和球盘摩擦试验机等手段对退火前后a-C:H膜的结构、组成和性能进行了系统地考察. 研究发现, 在较低的退火温度下(300℃), a-C:H膜结构无明显变化, 而其内应力降低, 摩擦学性能显著提高;在400℃和500℃下退火,膜结构发生明显变化并伴随严重氧化, 同时摩擦学性能降低甚至完全失效. 结果表明, 退火温度的选择对a-C:H膜的结构、组成及性能具有重要影响.

关键词: a-CH膜, 退火温度, 结构, 摩擦学性能

Abstract: Hydrogenatedamorphous carbon (a-C:H) films were annealed in air, to investigate the effect of ambient temperatureon thestructure and properties of a-C:H films. After annealed at differenttemperatures, structure, composition and properties of a-C:H films wereinvestigated <>via Fourier transform infrared spectroscopy (FTIR), Raman spectroscope, X-ray photoelectronspectroscope (XPS), 3D surface profiler and ball-on-disk tribotester. Compared with the as-deposited film, thea-C:H film annealed at low temperature of 300℃ exhibits similar structure,with internal decreasing stress and notably improved tribological property. Comparatively,at elevated temperatures of 400℃ and 500℃, the annealed films present severe graphitization and oxidation, contributingto the deterioration of the tribological properties or even complete failure.Thus, the annealing temperature plays a significant role on the structure,composition and properties of a-C:H films.

Key words: a-C:H film, annealing temperature, structure, tribologicalproperty

中图分类号:

O484

王永霞, 冶银平, 李红轩, 吉利, 陈建敏, 周惠娣. 退火温度对 a-C:H 膜结构及摩擦学性能的影响[J]. 无机材料学报, 2011, 26(2): 209-213.

WANG Yong-Xia, YE Yin-Ping, LIHong-Xuan, JI Li, CHEN Jian-Min, ZHOUHui-Di. Effect of Annealing Temperature on the Structure andTribological Propertyof a-C:H Film[J]. Journal of Inorganic Materials, 2011, 26(2): 209-213.

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退火温度对 a-C:H 膜结构及摩擦学性能的影响

Effect of Annealing Temperature on the Structure andTribological Propertyof a-C:H Film

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