Journal of Inorganic Materials ›› 2024, Vol. 39 ›› Issue (4): 416-422.DOI: 10.15541/jim20230392

Special Issue: 【材料计算】计算材料(202409)

• RESEARCH ARTICLE • Previous Articles     Next Articles

Heteroepitaxial Diamond Nucleation and Growth on Iridium: First-principle Calculation

WANG Weihua1(), ZHANG Leining2, DING Feng3(), DAI Bing4(), HAN Jiecai4, ZHU Jiaqi4, JIA Yi1, Yang Yu5   

  1. 1. China Aerospace Science and Technology Innovation Research Institute, China Aerospace Science and Technology Corporation, Beijing 100176, China
    2. School of Chemistry and Chemical Engineering, Beijing Institute of Technology, Beijing 102488, China
    3. Faculty of Materials Science and Engineering/Institute of Technology for Carbon Neutrality, Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518055, China
    4. National Key Laboratory of Special Environment of Composite Technology, Harbin Institute of Technology, Harbin 150001, China
    5. Beijing Institute of Control Engineering, Beijing 100190, China
  • Received:2023-08-30 Revised:2023-11-06 Published:2024-04-20 Online:2023-11-28
  • Contact: DING Feng, professor. E-mail: f.ding@siat.ac.cn;
    DAI Bing, professor. E-mail: daib@hit.edu.cn
  • About author:WANG Weihua (1992-), male, PhD. E-mail: weihuawang2011@163.com
  • Supported by:
    National Key R&D Program of China(2020YFA0709700);National Key R&D Program of China(2016YFE0201600);National Natural Science Foundation of China(52072087);Guangdong Key Research and Development Program(2020B010169002);Heilongjiang Natural Science Foundation(YQ2020E008);The Fundamental Research Funds for the Central Universities(HIT.OCEF.2022048)

Abstract:

Heteroepitaxy provides an effective path for the synthesis of diamond wafers. After more than 20 years of development, the diamond nucleation and growth technology on iridium substrates has enabled to prepare crystals with a maximum diameter of 3.5 inches, which opens a door to application diamond as ultimate semiconductor in the future chip industry. However, a series of problems that occur on heterogeneous substrates, such as surface nucleation, bias process window, and diamond epitaxial growth, need to overcome from the perspective of growth thermodynamics. In this study, aiming at the key issue how diamond can achieve epitaxial nucleation and growth in chemical vapor deposition atmosphere, a simulation study was carried out on the nucleation and growth process of diamond at the atomic scale based on the first-principle calculation. The results show that the adsorption of C atoms on the surface of the Ir substrate is more stable than that on the bulk phase, which indicates that diamond nucleation can only occur on the substrate surface. The number of C atoms of sp3 hybridization in the amorphous hydrogenated carbon layer increases firstly and then decreases with the increase of ion kinetic energy under ion bombardment, confirming the existence of the ion kinetic energy or bias voltage window in the high-density nucleation of diamond. The interfacial binding energy is the lowest (about -0.58 eV/C) when diamond is epitaxially grown along the Ir substrate, meaning that the interface binding energy is the decisive thermodynamic factor for the epitaxial growth. In conclusion, this study clarifies the thermodynamic mechanism of single crystal diamond epitaxial growth under the bias-assisted ion bombardment, and points out a great significant guidance for the growth of diamond and other carbon based semiconductors.

Key words: diamond, heteroepitaxy, nucleation and growth, first-principle, binding energy

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