Journal of Inorganic Materials

• Research Paper • Previous Articles     Next Articles

IR Spectrum of the Amorphous Nano Si3N4 Powder and Film Synthesized by PCVD

LU Zhongqian; JIANG Dongliang; TAN Shouhong   

  1. Shanghai Institute of Ceamics; Chinese Academy of Sciences Shanghai 200050 China
  • Received:1996-05-23 Revised:1996-07-01 Published:1997-06-20 Online:1997-06-20

Abstract: High pure ultrafinc Si3N4 powders were obtAlNed by Plasma Cold-discharge Chemical VaporDeposition Method. After storage for various time and baking with infrared lamp, IR spectra ofthe powders were measured. IR spectra revealed that oxidation occurred as soon as the powderexposed to the air. With the continuation of the storage, the oxidation on the surface developedand the adsorption peak of Si-O bond obviously increased while the adsorption peaks of So-N-Siand Si-H bonds decreased. The characteristic adsorptions of PCVD synthesized amorphous films were wide and strong, similar to those of the fresh synthesized powder. Howere they did not change with time.

Key words: PCVD, amorphous silicon nitride powders, oxidation, IR spectrum