[1] Wang Dan-Yang, Zhu Bai-Lin, Liu Tao, et al. J. Appl. Phys., 2006, 99 (084103): 1--6. [2] Radhapiyari L, James A R, Thakur O P, et al. Materials Science and Engineering B, 2005, 117: 5--9. [3] Kim J K, Kim S S, Kim W J, et al. Materials Letters, 2006, 60 (19): 2322--2325. [4] Kim Kyoung-Tae, Kim Chang-Il. Surface & Coating Technology, 2006, 200 (16-17): 4708--4712. [5] Zhu X H, Zheng D N, Peng W, et al. Materials Letters, 2006, 60: 1224--1228. [6] Zheng Y B, Wang S J, Huan A C H, et al. J. Appl. Phys., 2006, 99 (014106): 1--4. [7] Navi N, Horwitz J S, Auyeung R C Y, et al. Thin Solid Films, 2006, 510: 115--118. [8] Cao L Z, Heng B L C, Wang S Y, et al. J. Appl. Phys., 2005, 98 (034106): 1--4. [9] Kim Kyoung-Tae, Kim Chang-Il. Thin Solid Films, 2005, 472: 26--30. [10] Sun Xiao-Hua, Guo Shi-Shang, Wu Geng-Zhu, et al. Journal of Crystal Growth, 2006, 290: 121--126. [11] 鲍军波, 任天令, 刘建设, 等. 压电与声光, 2002, 24 (5): 389--391. [12] Jain M, Majumder S B, Katiyar R S, et al. Appl. Phys. Lett., 2003, 82 (12): 1911--1913. [13] Jain M, Majumder S B, Matinez A, et al. Integrated Ferroelectrics, 2002, 42: 343--355. [14] Cole M W, Hubbard C, Ngo E, et al. J. Appl. Phys., 2002, 92 (1): 475--483. [15] Joshi P C, Cole M W. Appl. Phys. Lett., 2000, 77: 289--291. [16] 吴顺华, 陈力颖, 陈晓娟, 等. 硅酸盐学报(Journal of The Chinese Ceramic Society), 2001, 29 (1): 80--83. [17] Cullity B D. Elements of X-ray Diffraction, second ed., Addisonwesley, Reading, MA, 1978.102. [18] Johnson K M. J. Appl. Phys., 1962, 33 (9): 2826--2831. |