Journal of Inorganic Materials

• Research Paper • Previous Articles     Next Articles

Influence of Tiny ZnO on Luminescence Intensity of Zn2SiO4:Mn Films

XI Jun-Hua, JI Zhen-Guo, LIU Kun, WANG Chao, DU Juan
  

  1. (State Key Lab for Silicon Materials, Zhejiang University, Hangzhou 310027, China)
  • Received:2006-01-03 Revised:2006-03-17 Published:2006-11-20 Online:2006-11-20

Abstract: Magnesium-doped zinc silicate (Zn2SiO4:Mn) was prepared on oxidized silicon wafer by a simple sol-gel process. The crystallinity of films was characterized by X-ray diffraction and optical properties were measured by UV-Vis and photoluminescence spectra. The influence of annealing temperature on films properties was also studied systematically. It’S found that proper ZnO can enhance the photoluminescence intensity of Zn2SiO4:Mn films. And the mechanism was explained by using the model of quantum confinement-luminescence center proposed by G.G. Qin.

Key words: Zn2SiO4, ZnO, photoluminescence, quantum confinement-luminescence center

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