Preparation of Wrinkled Hexagonal Boron Nitride Films by Bubbling Chemical Vapor Deposition

doi:10.15541/jim20260206

Abstract

Abstract: Hexagonal Boron Nitride (h-BN) has important value in fields such as microelectronic packaging and advanced thermal management. However, traditional chemical vapor deposition (CVD) technology is limited because the reaction interface is difficult to refresh continuously. The low-cost, continuous, and scalable production of highly crystalline 2D h-BN films still faces challenges. To address this, this study aims to expand bubbling chemical vapor deposition technology. We designed Fe-B or Fe-Cr-Ni-B reaction melts. A gas-liquid reaction space is constructed by continuously introducing nitrogen gas. This promotes the continuous growth of h-BN films on dynamically refreshing bubble surfaces or inside the melts. For the molten Fe-B system, h-BN films with about 10 layers were prepared. These films possess high crystallinity, rich microstructures, and resistance under high-temperature reducing/oxidizing atmospheres. For the molten Fe-Cr-Ni-B system, the introduction of Ni and Cr elements improves the solubility of B and N in the melt. This guides the reaction from the gas-liquid surface into the liquid bulk. We prepared onion-like h-BN microspheres with a size of about 1 μm. In summary, based on the bubbling chemical vapor deposition method, this study establishes boron-containing alloy melt systems. This approach provides a new technical path for the scalable and controllable preparation of h-BN with different morphologies.

Key words: bubbling chemical vapor deposition, h-BN, boron-containing alloy, microstructures

CLC Number:

TQ174

DAI Zongrun, SHI Zhiyuan, ZHU Yulin, HE Peng, YU Qingkai. Preparation of Wrinkled Hexagonal Boron Nitride Films by Bubbling Chemical Vapor Deposition[J]. Journal of Inorganic Materials, DOI: 10.15541/jim20260206.

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