ZnO薄膜及其性能研究进展

无机材料学报

ZnO薄膜及其性能研究进展

黄焱球; 刘梅冬; 曾亦可; 刘少波

华中科技大学电子科学与技术系, 武汉 430074

收稿日期:2000-05-08 修回日期:2000-06-26 出版日期:2001-05-20 网络出版日期:2001-05-20

Progress of Study on ZnO Thin Film and its Properties

HUANG Yan-Qiu; LIU Mei-Dong; ZENG Yi-Ke; LIU Shao-Bo

Department of Electronic Science and Technology; Huazhong University of Science and Technology; Wuhan 430074; China

Received:2000-05-08 Revised:2000-06-26 Published:2001-05-20 Online:2001-05-20

摘要/Abstract

摘要： ＺｎＯ薄膜是一种具有优良的压电、光电、气敏、压敏等性质的材料，在透明导体、发光元件、太阳能电池窗口材料、光波导器、单色场发射显示器材料、高频压电转换器、表面声波元件、微传感器以及低压压敏电阻器等方面具有广泛的用途．ＺｎＯ薄膜的制备方法多样，各具优缺点；而薄膜性质的差异则取决于不同的掺杂组分，并与制备工艺紧密相关．本文综述了ＺｎＯ薄膜的制备及性质特征，并对其发展趋势及前景进行了探讨．

关键词: ZnO薄膜, 制备, 性质, 发展前景

Abstract: ZnO thin films are the materials with many excellent properties such as piezoeletricity, conductivity,
optical absorption and emission, gas-sensitivity, and highly nonlinear voltage-current characteristics. They have a wide variety of applications
such as transparent conductors, luminescence diode, window materials for solar cells, optical wave guides, phosphor for monochrome field emission
displays, piezoelectric transducers in the GHz range, surface acoustic wave devices, micro-sensors and micro-actuators, and low-voltage varistors.
There are many methods for the preparation of ZnO thin films, and each has its advantages and disadvantages. The properties of ZnO thin films depend on the dopants and the preparation conditions. This paper reviews the
preparations and properties of ZnO thin films, and discusses their development prospects.

Key words: ZnO thin film, preparation methods, properties, development prospects

中图分类号:

O484

黄焱球,刘梅冬,曾亦可,刘少波. ZnO薄膜及其性能研究进展[J]. 无机材料学报.

HUANG Yan-Qiu,LIU Mei-Dong,ZENG Yi-Ke,LIU Shao-Bo. Progress of Study on ZnO Thin Film and its Properties[J]. Journal of Inorganic Materials.

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