脉冲激光沉积ZrW2O8薄膜的制备和性能

doi:10.3724/SP.J.1077.2011.00540

无机材料学报 ›› 2011, Vol. 26 ›› Issue (5): 540-544.DOI: 10.3724/SP.J.1077.2011.00540 CSTR: 32189.14.SP.J.1077.2011.00540

脉冲激光沉积ZrW₂O₈薄膜的制备和性能

刘红飞¹, 张志萍², 张伟¹, 陈小兵¹, 程晓农³

(1. 扬州大学物理学院, 扬州 225009; 2. 江海学院扬州 225101; 3. 江苏大学材料科学与工程学院, 镇江 212013)

收稿日期:2010-07-08 修回日期:2010-08-21 出版日期:2011-05-20 网络出版日期:2011-06-07
作者简介:刘红飞(1982-), 男, 博士, 助理研究员. E-mail: liuhf@yzu.edu.cn
基金资助:
国家自然科学基金(50372027); 江苏省高校自然科学重大基础研究项目(06KJA43010); 扬州大学人才引进项目(0274640015427)

Preparation and Properties of ZrW₂O₈Thin Films Deposited by Pulsed Laser Deposition

LIU Hong-Fei¹, ZHANG Zhi-Ping², ZHANG Wei¹, CHEN Xiao-Bing¹, CHENG Xiao-Nong³

(1. College of Physics Science and Technology, Yangzhou University, Yangzhou 225002, China; 2. Jianghai College, Yangzhou 225101, China; 3. School of Materials Science and Engineering, Jiangsu University, Zhenjiang 212013, China)

Received:2010-07-08 Revised:2010-08-21 Published:2011-05-20 Online:2011-06-07
Supported by:
National Natural Science Foundation of China (50372027); Key Program for Basic Research of Jiangsu Province Natural Science Foundation for University (06KJA43010); Yangzhou Unversity Development Foundation for Talents (0274640015427)

摘要/Abstract

摘要： 采用脉冲激光沉积法在石英基片上沉积制备了ZrW₂O₈薄膜. 用X射线衍射仪(XRD)、原子力显微镜(AFM)研究了不同衬底温度对薄膜结构组分、表面粗糙度和形貌的影响, 用台阶仪和分光光度计测量薄膜的厚度和不同衬底温度下制备薄膜的透射曲线, 用变温XRD分析了ZrW₂O₈薄膜的负热膨胀特性. 实验结果表明: 在衬底温度为室温、550℃和650℃下脉冲激光沉积的ZrW₂O₈薄膜均为非晶态, 非晶膜在1200℃保温3min后淬火得到立方相ZrW₂O₈薄膜; 随着衬底温度的升高, ZrW₂O₈薄膜的表面粗糙度明显降低; 透光率均约为80%, 在20~600℃温度区间内, 脉冲激光沉积制备的ZrW₂O₈薄膜的负热膨胀系数为-11.378×10^-6 K^-1.

关键词: 钨酸锆, 薄膜, 脉冲激光沉积, 负热膨胀, 透射率

Abstract: ZrW₂O₈ thin films were deposited on quartz substrates by pulsed laser deposition method. Effects of substrate temperature on the microstructure, composition, surface roughness and morphology of the ZrW₂O₈thin films were observed by X-ray diffraction (XRD) and atomic force microscope (AFM). The thickness and optical transmittance of the ZrW₂O₈ thin films were measured by surface profilometer and spectrophotometer respectively. The negative thermal expansion property of the ZrW2O8 thin film was measured by high temperature X-ray diffraction. The results indicate that the as-deposited ZrW₂O₈thin films deposited at the substrate temperature of room temperature, 550℃ and 650℃ are amorphous phase, and the cubic ZrW₂O₈thin film can be obtained after annealing at 1200 ℃ for 3 min and then quenching in water. With the increase of deposition temperature, the surface roughness decreases markedly. The optical transmittances of the ZrW₂O₈ thin films prepared at different condition are about 80%, and the negative thermal expansion coefficient of the resulting cubic ZrW₂O₈ thin film is -11.378×10^-6 K^-1 in the temperature range from 20℃ to 600℃.

Key words: ZrW₂O₈, thin film, pulsed laser deposition, negative thermal expansion, transmittance

中图分类号:

O484
TB43

刘红飞, 张志萍, 张伟, 陈小兵, 程晓农. 脉冲激光沉积ZrW₂O₈薄膜的制备和性能[J]. 无机材料学报, 2011, 26(5): 540-544.

LIU Hong-Fei, ZHANG Zhi-Ping, ZHANG Wei, CHEN Xiao-Bing, CHENG Xiao-Nong. Preparation and Properties of ZrW₂O₈Thin Films Deposited by Pulsed Laser Deposition[J]. Journal of Inorganic Materials, 2011, 26(5): 540-544.

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脉冲激光沉积ZrW₂O₈薄膜的制备和性能

Preparation and Properties of ZrW₂O₈Thin Films Deposited by Pulsed Laser Deposition

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