沉积激光能量对 CuAlO2 薄膜光学性质的影响

doi:10.3724/SP.J.1077.2011.00281

无机材料学报 ›› 2011, Vol. 26 ›› Issue (3): 281-285.DOI: 10.3724/SP.J.1077.2011.00281

沉积激光能量对 CuAlO₂ 薄膜光学性质的影响

邓赞红 ¹,² , 方晓东¹,², 陶汝华¹,², 董伟伟¹,², 周曙¹,², 孟钢¹,², 邵景珍¹,²

1. 中国科学院安徽光学精密机械研究所安徽光子器件与材料省级实验室, 合肥230031; 2. 中国科学院新型薄膜太阳电池重点实验室, 合肥230031

收稿日期:2010-06-05 修回日期:2010-07-17 出版日期:2011-03-20 网络出版日期:2011-02-18
作者简介:邓赞红(1981-), 女, 博士, 助理研究员.
基金资助:
安徽省自然科学基金(090414169); 中国科学院合肥物质科学研究院知识创新工程青年人才领域前沿项目

Effect of Deposition LaserEnergy on the Optical Properties of CuAlO₂ Films

DENG Zan-Hong¹,² , FANG Xiao-Dong¹,² , TAO Ru-Hua¹,² , DONG Wei-Wei¹,² , ZHOU Shu¹,² , MENG Gang¹,² , SHAO Jing-Zhen¹,²

1. Anhui Provincial Key Lab of Photonics Devices and Materials, Anhui Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Hefei 230031, China; 2. Key Lab of New Thin Film Solar Cells, Chinese Academy of Sciences, Hefei 230031, China

Received:2010-06-05 Revised:2010-07-17 Published:2011-03-20 Online:2011-02-18
Supported by:
Natural Science Foundation of Anhui Province(090414169); The KnowledgeInnovation Program of the Chinese Academy of Sciences

摘要/Abstract

摘要： 采用脉冲激光沉积法制备了CuAlO₂薄膜. 在沉积激光能量100~180mJ范围内原位沉积的薄膜并在N₂气氛下900℃异位退火1h处理后, 所有薄膜均为高度 c 轴取向的单相CuAlO₂薄膜, 晶粒尺寸~49nm. 随着沉积激光能量的增大, 薄膜厚度增加, 表面颗粒尺寸明显增大, 在可见光区的平均透射率下降. 室温光致发光谱发现, CuAlO₂薄膜在350nm附近有一个自由激子复合发光峰, 说明在CuAlO₂宽带隙半导体中存在直接带间跃迁, 这对于该材料在光电子领域如发光二极管的应用具有重要意义.

关键词: 脉冲激光沉积, CuAlO₂薄膜, 光学带隙, 室温光致发光谱

Abstract: CuAlO₂ films were prepared by pulsed laser deposition (PLD) on Al₂O₃(001).And the effect of deposition laser energy on the microstructure, morphologies and optical properties of the films were studied. The in-situ deposited films were amorphous in the deposition laser energyof 100-180mJ. After ex-situ annealed in N₂ atmosphere at 900℃ for 1 h, all the films were single phase CuAlO₂with c-axis orientation and the crystal sizes were about 49nm. With the increase of deposition laser energy,the film thickness and surface particle sizes increased, while the visiblelight transmittance decreased. Room-temperature photoluminescence measurements of the CuAlO₂ films deposited with laser energy of 100mJ and 180mJ only showed an ultraviolet near-band-edge emission peak at 350 nm (around 3.5eV) in the range of 325-650 nm, which originated from the generation and recombination of electron-hole pairs, namely, excitons. This observation indicates the existence of direct transition-type band gap of thismaterial, which is favorable for the optoelectronics applications such aslight-emitting diodes (LEDs).

Key words: pulsed laser deposition, CuAlO₂ films, optical band energy, room-temperature photolumine scence spectra

中图分类号:

TQ174

邓赞红, 方晓东, 陶汝华, 董伟伟, 周曙, 孟钢, 邵景珍. 沉积激光能量对 CuAlO₂ 薄膜光学性质的影响[J]. 无机材料学报, 2011, 26(3): 281-285.

DENG Zan-Hong, , FANG Xiao-Dong, , TAO Ru-Hua, , DONG Wei-Wei, , ZHOU Shu, , MENG Gang, , SHAO Jing-Zhen,. Effect of Deposition LaserEnergy on the Optical Properties of CuAlO₂ Films[J]. Journal of Inorganic Materials, 2011, 26(3): 281-285.

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沉积激光能量对 CuAlO₂ 薄膜光学性质的影响

Effect of Deposition LaserEnergy on the Optical Properties of CuAlO₂ Films

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