不同厚度四面体非晶碳薄膜的高通量制备及表征

doi:10.15541/jim20180027

无机材料学报 ›› 2018, Vol. 33 ›› Issue (11): 1173-1178.DOI: 10.15541/jim20180027 CSTR: 32189.14.10.15541/jim20180027

不同厚度四面体非晶碳薄膜的高通量制备及表征

魏菁^1,2, 李汉超^1,3, 柯培玲¹, 汪爱英¹

1. 中国科学院宁波材料技术与工程研究所, 中国科学院海洋新材料与应用技术重点实验室, 浙江省海洋材料与防护技术重点实验室, 宁波 315201;
2. 中国科学院大学, 北京 100049;
3. 上海科技大学物质科学与技术学院, 上海 201210

收稿日期:2018-01-16 修回日期:2018-03-09 出版日期:2018-11-16 网络出版日期:2018-10-20
作者简介:魏菁(1993-), 女, 博士研究生. E-mail: weijing@nimte.ac.cn
基金资助:
国家自然科学基金(51522106);浙江省重点研发计划(2017C01001);浙江省公益项目(2016C31121)

Characterization of Tetrahedral Amorphous Carbon Film with Various Thickness by High Through-put Method

WEI Jing^1,2, LI Han-Chao^1,3, KE Pei-Ling¹, WANG Ai-Ying¹

1. Zhejiang Key Laboratory of Marine Materials and Protective Technologies, Key Laboratory of Marine Materials and Related Technologies, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China;

2. University of Chinese Academy of Sciences, Beijing 100049, China;

3. Sohool of Physical Science and Technology, Shanghai Tech University, Shanghai 201210, China

Received:2018-01-16 Revised:2018-03-09 Published:2018-11-16 Online:2018-10-20
About author:WEI Jing. E-mail: weijing@nimte.ac.cn
Supported by:
National Natural Science Foundation of China (51522106);Zhejiang Key Research and Development Program (2017C01001);Public Projects of Zhejiang Province (2016C31121)

摘要/Abstract

摘要：

材料基因组工程能大幅度提高材料研发速度, 降低材料研发成本, 近年来受到广泛关注。本研究采用高通量制备工艺, 结合碳等离子体束流和基片位置的调控, 利用自主设计研制的45°双弯曲磁过滤阴极真空电弧设备, 沉积了厚度为4.7~183 nm的系列四面体非晶碳(ta-C)薄膜, 使用椭偏仪、原子力显微镜、拉曼光谱仪和X射线光电子能谱仪(XPS)表征了厚度对ta-C薄膜表面粗糙度、微结构和原子键态的影响。结果表明：通过碳等离子体束流和基片位置的调控, 实现了不同厚度ta-C薄膜的高通量制备。尽管膜厚不同, 所制备的ta-C薄膜均具有几乎不变的光滑表面(R_a=(0.38±0.02) nm)和色散值(Disp(G)), 说明不同厚度ta-C薄膜的sp³含量、sp²团簇尺寸保持相对稳定。XPS结果进一步证实ta-C薄膜的sp³相对含量均维持在(55±5)%。此外, 不同厚度ta-C薄膜的光学带隙E_opt均保持在(1.02±0.08)eV。相关结果为设计制备结构和光学性能可控的不同厚度ta-C薄膜提供了一种新思路。

关键词: 四面体非晶碳膜, 高通量, 厚度, 微结构, 光学带隙

Abstract:

Materials Genome Initiative (MGI), which greatly accelerates the research and development progress of new materials with reduced cost, has received widespread attention in recent years. In this report, high-quality ta-C films with different thicknesses, ranging from 4.7 nm to 183 nm, were high through-put deposited by a home-built double 45° bent filtered cathodic vacuum arc system, which was realized by the control of carbon plasma beam and substrate position. Meanwhile, the effects of film thickness on surface roughness, microstructure, and carbon atomic bond were investigated by atomic force microscope, spectroscopic ellipsometry, Raman spectra and X-ray photoelectron spectroscopy. Results show that the high through-put method by regulation of carbon plasma beam and selective placement of substrate enables to prepare ta-C films with various thicknesses. Particularly, the prepared ta-C films show almost constant smooth surface (R_a=(0.38±0.02) nm) and the value of Disp(G) regardless of the thickness changes, revealing the unchanged size of sp² cluster and sp³ content with different thicknesses. Furthermore XPS results confirm that sp³ relative content is kept at (55±5)%. In addition, the optical band gaps of ta-C films with different thicknesses remain at (1.02±0.08) eV. These results could provide new insight into design and fabricate the controlled microstructure and optical property of ta-C film with different thicknesses.

Key words: tetrahedral amorphous carbon film, high through-put, thickness, microstructure, optical band gap

中图分类号:

TQ127

魏菁, 李汉超, 柯培玲, 汪爱英. 不同厚度四面体非晶碳薄膜的高通量制备及表征[J]. 无机材料学报, 2018, 33(11): 1173-1178.

WEI Jing, LI Han-Chao, KE Pei-Ling, WANG Ai-Ying. Characterization of Tetrahedral Amorphous Carbon Film with Various Thickness by High Through-put Method[J]. Journal of Inorganic Materials, 2018, 33(11): 1173-1178.

图/表 7

图1 FCVA设备示意图(a)和样品位置示意图(b)

Fig. 1 Schematic diagram of FCVA system (a) and sample position (b)

表1 ta-C薄膜刻蚀和沉积的工艺参数

Table 1 Parameter of arc plasma etching and deposition for ta-C films

Process	Duct voltage/V	Arc current/A	Bias voltage/V	Ar flux/sccm	Time/min
Arc plasma etching	10.0	50.0	-300	20.0	5.0
Film deposition	10.0	50.0	-80	3.0	15/30/45

图2 不同样品厚度和生长速率的变化(虚线便于观察规律)

Fig. 2 Thicknesses (a) and growth rates (b) changes of different samples (The dotted lines faciliate observation)

图3 平均表面粗糙度随薄膜厚度的变化曲线

Fig. 3 Variations of the average surface roughness with film thickness

图4 不同厚度ta-C薄膜的紫外拉曼谱图(a), IT/IG(b), 色散值(c)

Fig. 4 UV Raman spectra (a), IT/IG (b), Disp(G) (c) of ta-C films with various film thickness.

图5 不同厚度ta-C薄膜的XPS C1s芯能级图谱(a)和sp3含量(c), 典型ta-C薄膜(41.3 nm)的C1s芯能级谱线(b)

Fig. 5 XPS C1s core level spectra (a) and sp3 content (c) of ta-C films with various film thickness, typical C1s core level spectrum of ta-C film (41.3 nm) (b)

图6 ta-C薄膜典型的消光系数(a)和光学带隙(b)图谱(膜厚为41.3 nm), 不同厚度ta-C薄膜的光学带隙图(c)

Fig. 6 Typical extinction coefficient (a) and optical bandgap (b) spectra of ta-C film with thickness of 41.3 nm, optical band gap of ta-C with different film thicknesses (c)

参考文献 24

[1]	ROBERTSON J.Diamond-like amorphous carbon.Materials Science and Engineering R, 2002, 37(4/5/6): 129-281.
[2]	ERDEMIR A, FENSKE G R, TERRY J, et al. Effect of source gas and deposition method on friction and wear performance of diamond-like carbon films. Surface and Coatings Technology, 1997, 94-95(1): 525-530.
[3]	WANG M, JIANG X, STRIZKER B, et al.Adhesion of hydrogenated amorphous carbon films on silicon substrates and its enhancement.Thin Solid Films, 1991, 197(1/2): 57-66.
[4]	ENKE K.Some new results on the fabrication of and the mechanical, electrical and optical properties of I-carbon layers.Thin Solid Films, 1981, 80(1/2/3): 227-234.
[5]	PALOMAKI T, WESTER N, CARO M A, et al.Electron transport determines the electrochemical properties of tetrahedral amorphous carbon (ta-C) thin films.Electrochimica Acta, 2017, 225: 1-10.
[6]	MCCANN R, ROY S S, PAPAKONSTANTINOU P, et al.The effect of thickness and arc current on the structural properties of FCVA synthesised ta-C and ta-C: N films.Diamond and related materials, 2005, 14(3): 983-988.
[7]	SHEEJA D, TAY B K, LEONG K W, et al.Effect of film thickness on the stress and adhesion of diamond-like carbon coatings.Diamond and Related Materials, 2002, 11(9): 1643-1647.
[8]	ZAVALEYEV V, WALKOWICZ J, KUZNETSOVA T, et al.The dependence of the structure and mechanical properties of thin ta-C coatings deposited using electromagnetic venetian blind plasma filter on their thickness.Thin Solid Films, 2017, 638: 153-158.
[9]	LI X W, XU S P, KE P L, et al.Thickness dependence of properties and structure of ultrathin tetrahedral amorphous carbon films: a molecular dynamics simulation.Surface & Coatings Technology, 2014, 258: 938-942.
[10]	MIYAKE S, KUROSAKA W, OSHIMOTO K.Nanometre scale mechanical properties of extremely thin diamond-like carbon films.Tribology - Materials, Surfaces & Interfaces, 2013, 3(4): 158-164.
[11]	SUNDARARAJAN S, BHUSHAN B.Development of a continuous microscratch technique in an atomic force microscope and its application to study scratch resistance of ultrathin hard amorphous carbon coatings.Journal of Materials Research, 2001, 16(2): 437-445.
[12]	MA X G, KOMVOPOULOS K, WAN D, et al.Effects of film thickness and contact load on nanotribological properties of sputtered amorphous carbon thin films.Wear, 2003, 254(10): 1010-1018.
[13]	LI H B, SUN L L, WU G S, et al.Simulation of magnetic field distribution in doubly-bent filter cathode of vacuum arc film growth setup.Chinese Journal of Vacuum Science and Technology, 2008, 29(3): 614-620.
[14]	CAI J, YANG W, DAI W, et al.Effect of substrate bias on structure and properties of Ta-C films.China Surface Engineering, 2011, 24(6): 62-67.
[15]	CAI J, YANG W, KE P L, et al.Influence of Ar flow rate on microstructures and tribological properties of tetrahedral amorphous carbon films.Chinese Journal of Vacuum Science and Technology, 2012, 32(8): 740-745.
[16]	XU S P, LI X W, HUANG M D, et al. Stress reduction dependent on incident angles of carbon ions in ultrathin tetrahedral amorphous carbon films. Applied Physics Letters, 2014,104(14): 141908-1-4.
[17]	GUO T, ZUO X, GUO P, et al.Effect of etching process on growth and properties of tetrahedral amorphous carbon film.Surface Technology, 2017, 46(4): 143-149.
[18]	ZHAO J C.A perspective on the materials genome initiative.Chinese Journal of Nature, 2014, 36(2): 89-104.
[19]	WANG HAI-ZHOU, WANG HONG, DING HONG, et al.Progress in high-throughput materials synthesis and characterization.Science & Technology Review, 2015, 33(10): 31-49.
[20]	EVANS J W.Factors mediating smoothness in epitaxial thin-film growth.Physical Review B, 1991, 43(5): 3897-3905.
[21]	ZHONG M, ZHANG C H, LUO J B.Effect of substrate morphology on the roughness evolution of ultrathin DLC films.Applied Surface Science, 2008, 254(21): 6742-6748.
[22]	FERRARI A C, ROBERTSON J.Raman spectroscopy of amorphous, nanostructured, diamond-like carbon, and nanodiamond.Philosophical Transactions, 2004, 362(1824): 2477-2512.
[23]	TAUC J, GRIGOROV R, VANCU A.Optical properties and electronic structure of amorphous germ anium.Phys. Status Solidi, 1966, 15(2): 627-637.
[24]	薛群基, 王立平. 类金刚石碳基薄膜材料. 北京: 科学出版社, 2012, 585.

不同厚度四面体非晶碳薄膜的高通量制备及表征

Characterization of Tetrahedral Amorphous Carbon Film with Various Thickness by High Through-put Method

RichHTML

PDF (PC)

可视化

被引次数

摘要/Abstract

引用本文

使用本文

图/表 7

参考文献 24

相关文章 15

编辑推荐

Metrics

本文评价

[1]	郑嘉乾, 卢霄, 鲁亚杰, 王迎军, 王臻, 卢建熙. 医用生物陶瓷的功能性生物适配机制及应用[J]. 无机材料学报, 2024, 39(1): 1-16.
[2]	贺丹琪, 魏明旭, 刘蕤之, 汤志鑫, 翟鹏程, 赵文俞. 一步法制备重费米子YbAl₃热电材料及其性能提升[J]. 无机材料学报, 2023, 38(5): 577-582.
[3]	黄毅华, 黄政仁, 沙闻浩, 周雅斌, 谭周茜, 张明康. 大厚度SiC素坯的脱脂分析及其无压高致密制备[J]. 无机材料学报, 2023, 38(10): 1163-1168.
[4]	洪督, 牛亚然, 李红, 钟鑫, 郑学斌. 等离子喷涂TiC-Graphite复合涂层摩擦磨损性能[J]. 无机材料学报, 2022, 37(6): 643-650.
[5]	徐谱昊, 张相召, 刘桂武, 张明芬, 桂新易, 乔冠军. Al-Ti合金钎焊SiC陶瓷接头界面微观结构与力学性能[J]. 无机材料学报, 2022, 37(6): 683-690.
[6]	黄龙之, 殷杰, 陈晓, 王新广, 刘学建, 黄政仁. 低黏结剂含量SiC素坯的选区激光烧结[J]. 无机材料学报, 2022, 37(3): 347-352.
[7]	孙鲁超, 周翠, 杜铁锋, 吴贞, 雷一明, 李家麟, 苏海军, 王京阳. 光悬浮区熔定向凝固Al₂O₃/Er₃Al₅O₁₂和Al₂O₃/Yb₃Al₅O₁₂共晶陶瓷的制备与性能研究[J]. 无机材料学报, 2021, 36(6): 652-658.
[8]	刘茜, 王家成, 周真真, 徐小科. 微纳粉体样品库高通量并行合成的研究进展[J]. 无机材料学报, 2021, 36(12): 1237-1246.
[9]	杨以娜, 王冉冉, 孙静. MXenes在柔性力敏传感器中的应用研究进展[J]. 无机材料学报, 2020, 35(1): 8-18.
[10]	李鑫, 席丽丽, 杨炯. 热电材料的第一性原理高通量研究[J]. 无机材料学报, 2019, 34(3): 236-246.
[11]	骆军, 何世洋, 李志立, 李永博, 王风, 张继业. 热电材料高通量实验制备与表征方法[J]. 无机材料学报, 2019, 34(3): 247-259.
[12]	邢媛媛, 吴海波, 刘学建, 黄政仁. 颗粒级配对固相烧结碳化硅陶瓷的影响[J]. 无机材料学报, 2018, 33(11): 1167-1172.
[13]	孟祥鲁, 霍翰宇, 郭向欣, 董绍明. 薄膜厚度对α-SiO_x薄膜负极电化学性能的影响[J]. 无机材料学报, 2018, 33(10): 1141-1146.
[14]	郑遗凡, 张露露, 王锴, 潘再法. 混合尖晶石型Zn₆Ga₈TiO₂₀:Cr³⁺荧光粉的合成、结构表征与发光性能[J]. 无机材料学报, 2018, 33(1): 9-13.
[15]	梁汉琴, 姚秀敏, 黄政仁, 曾宇平. 液相烧结碳化硅陶瓷的原位研究[J]. 无机材料学报, 2016, 31(4): 443-448.