[1] Hoffmann M R, Martin S T, Choi W, et al. Chem. Rev., 1995, 95: 69--96. [2] 罗仲宽, 宋力昕, 蔡弘华, 等(LUO Zhong-Kuan, et al). 无机材料学报(Journal of Inorganic Materials), 2006, 21 (1): 145--150. [3] Tryk D A, Fujishima A, Honda K. Electrochim. Acta, 2000, 45: 2363--2376. [4] Sproul W D, Graham M E, Rudnik P J, et al. Surf. Coat. Tech., 1997, 89: 10--15. [5] Zhang Q M, Griffin G L. Thin Solid Films, 1995, 263: 65--71. [6] Yu J G, Zhao X J, Zhao Q N. Thin Solid Films, 2000, 379: 7--14. [7] Yu C J, Yu J G, Zhang L Z, et al. J. Photoch. Photobio. A: Chem, 2002, 148: 263--271. [8] 张剑平, 孙召梅, 施利毅, 等(ZHANG Jian-Ping, et al). 无机材料学报(Journal of Inorganic Materials), 2005, 20 (5): 1243--1249. [9] Richardson J T, Garrait M, Hung J K. Appl. Catal. A-Gen., 2003, 2550: 69--82. [10] Peng Y, Richardson J T. Appl. Catal. A-Gen., 2004, 2660: 235--244. [11] Buciuman F C, Czarnetzki B K. Catal. Today, 2001, 69: 337--342. [12] Hwang K S, Zhu H Y, Lu G Q. Catal. Today, 2001, 68: 183--190. [13] Zhe D, H Xijun, Po L, et al. Catal. Today, 2001, 68: 173--182. [14] Molina A I, Robles J M, Garc$\acutei$a P B. J. Catal. 2004, 225: 479--488. [15] Atienzar P, Corma A, Garcia H, et al. Chem. Mater. 2004, 16: 982--987. [16] 李佑稷, 李效东, 李君文, 等(LI You-Ji, et al). 无机材料学报(Journal of Inorganic Materials), 2005, 20 (2): 291--298. [17] Leng W H, Liu H, Cheng S A, et al. J. Photoch. Photobio. A: Chem, 2000, 131: 125--132. [18] Liu H, Cheng S A, Zhang J Q, et al. Chemosphere, 1999, 38 (2): 283--292. [19] Takeda N, Torimoto T, Sampath S, et al. J. Phys. Chem., 1995, 99 (24): 9986--9991. [20] Takeda N, Ohtani M, Torimoto T, et al. J. Phys. Chem. B, 1997, 101: 2644--2649. [21] Uchida H, Itoh S, Yoneyama H. Chem. Lett. 1993. 1995--1998. [22] Torimoto T, Ito S, Kuwabata S, et al. Environ. Sci. Technol. 1996, 30: 1275--1281. [23] Sopyan I, Watanabe M, Fujishima A, et al. J. Photoch. Photobio. A: Chem, 1996, 98: 79--86. |