无机材料学报

• •    

基于多孔ITO电极的WO3薄膜的制备及其电致变色性能

杨光, 张楠, 陈舒锦, 王义, 谢安, 严育杰   

  1. 厦门理工学院 材料科学与工程学院,福建省功能材料及应用重点实验室,厦门 361024
  • 收稿日期:2024-12-23 修回日期:2025-01-23
  • 作者简介:杨 光(2000–), 男, 硕士研究生. E-mail: yangguang@stu.xmut.edu.cn
  • 基金资助:
    国家自然科学基金(62304189); 福建省自然科学基金(2023J011450; 2024J011211)

Preparation and Electrochromic Properties of WO3 Films Based on Porous ITO Electrodes

YANG Guang, ZHANG Nan, CHEN Shujin, WANG Yi, XIE An, YAN Yujie   

  1. Fujian Key Laboratory of Functional Materials and Applications, School of Materials Science and Engineering, Xiamen University of Technology, Xiamen 361024, China
  • Received:2024-12-23 Revised:2025-01-23
  • About author:YANG Guang (2000–), male, Master candidate. E-mail: yangguang@stu.xmut.edu.cn
  • Supported by:
    National Natural Science Foundation of China (62304189); Natural Science Foundation of Fujian Province (2023J011450,2024J011211)

摘要: 电致变色智能窗可通过调制电致变色材料的光学透过率来调控室外入射光进而实现节能建筑。由于磁控溅射技术具有大面积和均匀沉积的优势, 利用其所制备的非晶三氧化钨(Tungsten Oxide, WO3)最有潜力实现商业化。然而, 磁控溅射制备的WO3薄膜电致变色性能远低于溶液法, 因其本征致密原子结构导致较低的离子传输效率。本研究提出了基于埋层多孔电极制备微结构磁控溅射基的WO3薄膜方法, 从而提高材料的光学调制幅度和转换时间。实验结果表明, 与致密薄膜相比, 通过该方法制备的微结构WO3薄膜展现出显著提升的电致变色性能。当微结构的WO3薄膜厚度增加到300 nm时, 获得最佳的电致变色特性, 包括高达79.08%的光学调制幅度、仅只有2.6 s的着色时间和2.0 s的褪色时间、以及高达52.5 C/cm2的着色效率。性能的提升主要归因于多孔ITO(Indium Tin Oxides, ITO)电极和微结构WO3薄膜的协同作用。多孔的ITO电极可增加与WO3组分的接触面积, 增加电荷注入WO3薄膜中, 进而促进氧化还原反应过程。此外, 微结构的WO3薄膜也增加了与电解液的接触面积, 随之增加了反应活性位点以及缩短的离子扩散路径, 进而加速离子扩散和迁移过程, 实现高效氧化还原反应和快速的离子传输。本工作为制备高性能微纳结构磁控溅射电致变色薄膜提供了一种有效的方法。

关键词: 电致变色, 磁控溅射, ITO电极, 多孔WO3

Abstract: Electrochromic smart windows enable the regulation of the indoor light through modulating the optical transmittance of electrochromic materials for realizing the energy-saving buildings. Amorphous tungsten oxide (WO3) film fabricated by magnetron sputtered technology are the most likely to be industrialized due to its advantages of the large-area and uniform deposition. However, the electrochromic characteristics of the sputtered WO3 film lags behind those of the solution-process approach due to inefficient ions transport arising from its intrinsically dense atomic structure. In this work, we propose a strategy to develop microstructured magnetron-sputtered WO3 films by introducing the buried porous electrodes for improving the optical modulation and switching time. The results demonstrate that the microstructured sputtered WO3 films prepared by this method exhibit significantly enhanced electrochromic characteristics compared with that of the dense WO3 films. When the thickness of microstructured WO3 was increased to 300 nm, the optimized electrochromic characteristics were achieved, with a remarkable optical modulation up to 79.08%, colouring and bleaching times of only 2.6 s and 2.0 s, and a high colouring efficiency of 52.5 C/cm2. The improved performance is mainly attributed to the synergistic effect of the porous ITO (Indium Tin Oxides, ITO) electrode and the microstructured WO3 film. The porous ITO electrode can increase the surface area with the WO3 component and then increases electronic charges injected into WO3 film, facilitating the redox reaction process. Moreover, the microstructured WO3 film offers a larger surface area with the electrolyte, increases reactive active sites and shortens ions diffusion pathway, which accelerates the ion diffusion and migration process, realizing efficient redox reactions and fast ion transport. This work provides an effective method for preparing high-performance micro- and nanostructured sputtered electrochromic films.

Key words: electrochromism, magnetron sputtering, ITO electrode, porous WO3

中图分类号: