Microstructure of LiNbO3 Thin Films Grown on Silicon Substrates by Pulsed Laser Deposition

Abstract

Abstract: A lithium niobate (LiNbO₃) thin film was fabricated by a pulsed laser deposition method on Si(001) substrate with about 5nm-thick amorphous silicon oxide surface layer, under the conditions of 600℃ substrate temperature and 30 Pa oxygen pressure. The film was investigated by transmission electron microscope and X-ray diffraction. The factors influencing on the evolution and preferred orientation of the LiNbO₃ were discussed. The results obtained show that the LiNbO₃ thin film is highly c-axis oriented perpendicularly to the substrate under the optimized deposition conditions above mentioned.

Key words: LiNbO₃, transmission electron microscopy, pulsed laser deposition

CLC Number:

TN304

LU Huan-Ming,YE Zhi-Zhen,HUANG Jing-Yun,WANG Lei,ZHAO Bing-Hui. Microstructure of LiNbO₃ Thin Films Grown on Silicon Substrates by Pulsed Laser Deposition[J]. Journal of Inorganic Materials.

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Microstructure of LiNbO₃ Thin Films Grown on Silicon Substrates by Pulsed Laser Deposition

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