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无机材料学报

无机材料学报

• 研究论文 • 上一篇    

金刚石/碳化硅复合梯度膜制备研究

石玉龙1; 姜辛2   

  1. 1. 青岛科技大学材料与环境科学学院, 青岛 266042; 2. Fraunhofer Inst.for Sur. Eng.&Thin Film; Bienroder Weg 54E; D-38108
  • 收稿日期:2002-12-05 修回日期:2003-02-10 出版日期:2004-01-20 网络出版日期:2004-01-20

Preparation of Diamond/Silicon Carbide Films with GradientComposition

SHI Yu-Long1; JIANG Xin2   

  1. 1. School of Material and Environment Science; Qingdao University of Science and Technology; Qingdao 266042; China; 2. Fraunhofer Institute of coatings and surface technology; Bienroder Weg 54E; D-38108; Braunschweig; Germany
  • Received:2002-12-05 Revised:2003-02-10 Published:2004-01-20 Online:2004-01-20

PDF (PC)

944

被引次数

16

摘要： 采用微波等离子化学气相沉积(MW-PCVD)制备金刚石/碳化硅复合梯度膜.工作气体为H2,CH4和Si[CH3]4(四甲基硅烷,TMS),其中H2∶CH4=100∶0.6,Si[CH3]4为0％-O.05％,沉积压力为3300Pa,基体温度为700℃,微波功率为700W.基体为单晶硅,在沉积前用纳米金刚石颗粒处理.沉积后的样品经扫描电子显微镜(SEM),电子探针显微分析(EPMA),X射线能量损失分析(EDX)表明:沉积膜中的碳化硅含量是随Si[CH3]4流量的变化而改变.通过改变Si[CH3]4的流量可以制备金刚石/碳化硅复合梯度膜,且梯度膜中金刚石与复合膜过渡自然平滑.

关键词: 微波等离子体化学气相沉积, 金刚石, 复合梯度膜

Abstract: iamond/SiC compositional gradient films were deposited by the microwave plasma CVD, using a gas mixture of hydrogen, methane and tetramethylsilane (TMS). Single crystalline silicon wafers, pretreated with nano-diamond particles
before deposition, were used as substrates. The films were characterized by scanning electron microscopy (SEM), electron probe microanalysis (EPMA) and energy-dispersive X-ray analysis (EDX). The results show that the content of diamond
and silicon carbide in the films changes with TMS flow rates, and diamond/silicon carbide films with gradient composition and smooth transition can be obtained by adjusting the TMS flow rate during deposition process.

Key words: MW-CVD, diamond, composite gradient film

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