Journal of Inorganic Materials ›› 2017, Vol. 32 ›› Issue (2): 197-202.doi: 10.15541/jim20160310

• Orginal Article • Previous Articles     Next Articles

Research of Graphene/Antireflection Nanostructure Composite Transparent Conducting Films

Shuang-Shuang HAN(), Li-Yue LIU, Yong-Kui SHAN, Fan YANG, De-Zeng LI()   

  1. School of Chemistry and Molecular Engineering, East China Normal University, Shanghai 200241, China
  • Received:2016-05-11 Revised:2016-08-22 Online:2017-02-20 Published:2017-01-13
  • About author:HAN Shuang-Shuang. E-mail: hss0823@126.com

Abstract:

The graphene film was directly deposited on SiO2 antireflection(AR) structure by remote catalyzation of Cu nanoparticles using chemical vapor deposition method to fabricate the transparent conducting films with graphene/AR composite structure. Continuous graphene hollow sphere array was obtained after removing SiO2 AR structure, and the peak intensity ratios of I2D/IG and ID/IG and the full-width at half-height maximum (FWHM) of the 2D peak in the Raman spectrum of the graphene grew in 10 min were 2.31, 0.77 and about 40 cm-1, respectively, which demonstrated that the continuous and low-defect few layer graphene was grown on the surface of SiO2 AR structure. By introducing the SiO2 AR structure, transmittance of the film increases by 5.5% at 550 nm and the sheet resistance decreases by 20.09% on the average. Data from this study suggest that this film can avoid complex transfer process, decrease damage, and on the meantime realize high transparency and high conductivity performance , showing obvious applicable prospects in the field of photovoltaic devices, flat panel display and so on.

Key words: transparent conducting films, graphene, CVD, remote catalyzation of Cu nanoparticles, SiO2 antireflection nanostructure

CLC Number: 

  • TQ174