Journal of Inorganic Materials ›› 2014, Vol. 29 ›› Issue (10): 1087-1092.doi: 10.15541/jim20140025

• Orginal Article • Previous Articles     Next Articles

Effect of Annealing Temperature on Metal/Dielectric Multilayers for Fabricating Broadband Pulse Compression Gratings

Jian-Bo WU1,2(), Yun-Xia JIN1(), He-Yuan GUAN1,2, Fan-Yu KONG1,2, Wen-Wen LIU1,2, Shi-Jie LIU1, Kui YI1   

  1. 1. Key Lab. of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
    2. University of Chinese Academy of Sciences, Beijing 100039, China
  • Received:2014-01-10 Revised:2014-03-06 Online:2014-10-20 Published:2014-09-22
  • About author:WU Jian-Bo. E-mail: jianbowu0204@126.com
  • Supported by:
    National Natural Science Foundation of China(1070029, 1104295)

Abstract:

Metal/dielectric multilayers were prepared by physical vapor deposition process using gold as the metal material, HfO2 and SiO2 as high and low refractive index materials, respectively. These stacks were used to fabricate broadband pulse compression gratings. Influences of annealing temperature on the surface root-mean-square roughness, reflectivity and resistance to chemical cleaning damage were investigated. The experimental results indicated that surface root-mean-square roughness of these multilayers changed only slightly after annealing. Their resistance to chemical cleaning damage improved with the annealing temperature increase, whereas their reflectivity decreased. The metal/dielectric multilayers annealed at 250℃ for 10 h could not only endure the process of chemical cleaning, but also slightly decrease the reflectivity, suggesting that it is an optimal annealing process for metal/dielectric multilayers.

Key words: metal/dielectric multilayers, pulse compression gratings, annealing, chemical cleaning, reflectivity

CLC Number: 

  • TG174