Electrodeposition and Characterization of Cu2O Thin Films on Transparent Conducting Glass

Abstract

Abstract: Electrochemical behavior of cuprous oxide was investigated by using the catholic reduction electrochemical method. The effects of some technological factors on Cu₂O thin films electrodeposited
on transparent conducting glass were also studied. Cu₂O thin films were characterized by Talystep, X-ray diffraction (XRD) , scanning electron microscope (SEM) and X-ray photoelectron spectroscope
(XPS). The optimum technological conditions were obtained as follows: the applied potential was -0.22～-0.45V (vs SCE) , bath temperature was 60℃, bath pH was 5.5～6.0 and concentration of (CH₃COO)₂Cu
was in the range 0.015～0.040mol/L. The results showed that with the increase of bath temperature, the grain size of Cu₂O film increased from 0.2μm to 0.4μm and it started to have (111) preferred
orientation at 60℃. The film had high purity and was porous.

Key words: cuprous oxide, electrodeposition, film, characterization

CLC Number:

O614
TB43

CHEN Zhi-Gang,TANG Yi-Wen,JIA Zhi-Jie,ZHANG Li-Sha,LI Jia-Lin,YU Ying. Electrodeposition and Characterization of Cu₂O Thin Films on Transparent Conducting Glass[J]. Journal of Inorganic Materials.

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Electrodeposition and Characterization of Cu₂O Thin Films on Transparent Conducting Glass

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