Effects of Annealing Temperatures on Resistive Switching Characteristics of TiO2 Based ReRAM

doi:10.3724/SP.J.1077.2012.11776

Abstract

Abstract: TiO₂ thin films were deposited on heavily doped silicon wafer by DC magnetron sputtering and the Au electrodes were evaporated on TiO₂/n⁺-Si by electric beam evaporation to get Au/TiO₂/n⁺-Si structured resistive random access memory (ReRAM). The effects of annealing temperatures on the crystalline structure of the TiO₂ thin films and the resistive switching characteristics of the fabricated device were investigated. Au/TiO₂/n⁺-Si structured device exhibits reversible and steady unipolar resistive switching behaviors. The values of set voltage, reset voltage, reset current and reset power vary with the annealing temperatures. The resistive switching mechanism is discussed based on the filamentary model. The results reveal that the fabricated device annealed at 500℃ has good nonvolatile property. The average ratio of resistances between high resistance state (HRS) and low resistance state (LRS) is larger than 10³ and the devices could maintain a sufficient margin of memory for more than 10 years. The resistive switching characteristic is remained after 100 switching cycling tests.

Key words: TiO₂ thin film, resistive switching, annealing temperature

CLC Number:

O472
O484

LI Hong-Xia, JI Zhen-Guo, XI Jun-Hua. Effects of Annealing Temperatures on Resistive Switching Characteristics of TiO2 Based ReRAM[J]. Journal of Inorganic Materials, 2012, 27(10): 1063-1067.

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