Journal of Inorganic Materials

• Research Paper •     Next Articles

Nucleation and Growth of CVD Diamond Films on Smooth SiSubstrate Pretreated by Nanodiamond Powders

SHAO Le-Xia; XIE Er-Qinga; HE De-Yana; CHEN Guang-Huaab; XU Kangc   

  1. aDepartment of Physics; Langzhou University Lanzhou 730000 China; bDepartment of Applied Physics; Beijing Polytechnic University Beijing 100022 China; cInstitute of Chemistry and Physics; Chinese Academy of Sciences Lanzhou 730000 China
  • Received:1998-01-20 Revised:1998-02-27 Published:1998-12-20 Online:1998-12-20

Abstract: Ultradispersed nanodiamond powder synthesized by explosive detonation was used for the pretreatment of mirror Si substrate for nucleation and growth of diamond by microwave plasma-CVD. Compared with the scratching pretreatment,
it is found that the pretreatment method by coating substrate with the slurry loading nanodiamond powder not only enhances both of density (up to 109 cm-2
and nucleation rate, improving the quality of grown-up film greatly, but also controls nucleation easily. In addition, this pretreatment is also very
cost-effective, non-damaging, and reproducible as well.

Key words: CVD diamond,nucleation,pretreatment of substrate,nanodiamond powder

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