Influence of Processing Parameters on the Deposition of a-CNx Films

Abstract

Abstract: The influence of basic processing parameters on the deposition of a-CN_x was studied.The results show that the increase of N flux enhances the deposition rate of the film as well asincreases its N content. While higher sputtering power leads to higher deposition rate. Further-more, the employment of bias will prove to be beneficial in the preparation of CN_x film in thatit not only facilitates the densification process and produces a smoother surface morphology, butalso increases the content of N in the film.

Key words: a-CN_x films, processing parameters, deposition

CLC Number:

O734.1

XIAO Xing-Cheng,JIANG Wei-Hut,SONG Li-Xin,TIAN Jing-Fen,HU Xing-Fang. Influence of Processing Parameters on the Deposition of a-CN_x Films[J]. Journal of Inorganic Materials.

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Influence of Processing Parameters on the Deposition of a-CN_x Films

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