Effect of Deposition Temperature on Microstructures and Properties of MoSi2 Coatings Prepared by Low Pressure Chemical Vapor Deposition

doi:10.3724/SP.J.1077.2009.00392

Abstract

Abstract: MoSi₂ coatings were prepared on Mo substrates by low pressure chemical vapor deposition（LPCVD）using SiCl₄ and H₂ as source gases, in the temperature range from 1000℃ to 1300℃. Effect of deposition temperature on the microstructures, phase composition, deposition process, deposition rates, hardness and the bonding strength between coatings and Mo matrix were studied. It is indicated that the MoSi₂ coatings deposited in the temperature range from 1100℃ to 1200℃ are compact consisting of single MoSi₂ phase. The deposition rates, hardness and the bonding strength increase with the increase of temperature；however above 1200℃, cracks and Si phase appear in the coating, the deposition rates, hardness and the bonding strength decrease. The deposition process is mainly controlled by the reaction between Si and Mo below 1100℃, while above 1100℃ the diffusion of Si in MoSi₂ coatings becomes the controlling step.

Key words: LPCVD, MoSi₂ coatings, microstructures, properties, deposition temperature

CLC Number:

TB332

WU Heng,LI He-Jun,WANG Yong-Jie,FU Qian-Gang,HE Zi-Bo,WEI Jian-Feng. Effect of Deposition Temperature on Microstructures and Properties of MoSi₂
Coatings Prepared by Low Pressure Chemical Vapor Deposition[J]. Journal of Inorganic Materials, DOI: 10.3724/SP.J.1077.2009.00392.

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Effect of Deposition Temperature on Microstructures and Properties of MoSi₂
Coatings Prepared by Low Pressure Chemical Vapor Deposition

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