Abstract: The feasibility of using the indentation test method to evaluate the adhesion property of chemical vapor deposited diamond film was investigated initially
on the basis of observations and analyses of the cracking or delamination ways of diamond films under indentation. The critical load for lateral crack initiation or
peeling-off (P_cr) and the cracking resistance (dP/dX), two useful adhesion parameters, were used to characterize the adhesion properties of diamond
films synthesized by various pretreatment methods and deposition process parameters. The relationships between adhesion properties and methane concentrations, deposition
pressures, deposition powers and residual stresses were studied. Adhesion properties of diamond films can be improved using proper pretreatment of substrate surface,
suitable methane concentration, lower deposition pressure and higher deposition power.

Key words: indentation test method, CVD diamond film, adhesion property, residual stress