Journal of Inorganic Materials

   

Investigation of Threading Screw Dislocation Evolution in 4H-SiC Single Crystals

ZHAO Ning1,2,3, WEI Fuyuan3, WANG Ping3, SHI Tingting3, WANG Bo2,3, YANG Jian2,3, LIU Chunjun2   

  1. 1. School of Materials Science and Engineering, Peking University, Beijing 100091, China;
    2. Beijing TankeBlue Semiconductor Co., Ltd., Beijing 102600, China;
    3. Shenzhen MiTK Semiconductor Co., Ltd., Shenzhen 518100, China
  • Received:2025-12-20 Revised:2026-02-02
  • Contact: LIU Chunjun, professor. E-mail: liuchunjun@tankeblue.cn
  • About author:ZHAO Ning (1986-), PhD candidate. E-mail: zhaoning@tankeblue.cn
  • Supported by:
    National Key R&D Program of China (2021YFB3601100)

Abstract: Threading screw dislocation (TSD) is critical defects in silicon carbide (SiC) single crystals and have a strong impact on epitaxial quality and device performance. With the increasing diameter of SiC substrates, understanding the evolution behavior of TSD during bulk growth is of growing importance. This study aims to investigate the evolution characteristics of TSD in 6-inch 4H-SiC single crystals and to clarify the influence of crystal growth front convexity on TSD generation. Four 6-inch 4H-SiC single crystals with different growth convexities ranging from 0.36 to 2.58 mm were grown by the physical vapor transport (PVT) method through thermal field regulation. Longitudinal cross-sectional samples were characterized using X-ray topography (XRT) to trace the evolution behavior of individual TSD. Thermal field simulations were performed to analyze the relationship between temperature gradient and local C/Si ratio. XRT results reveal multiple TSD evolution behaviors, including inheritance from the seed, newly generated dislocations, merging and annihilation, and bending. The density of newly generated TSD during the initial growth stage increases monotonically with crystal convexity. When the convexity increases from 0.36 to 2.58 mm, the initial newly generated TSD density rises and reaches approximately 126 cm-2. Thermal field simulations indicate that larger convexity leads to steeper temperature gradients and a reduced C/Si ratio, promoting silicon droplet formation and TSD nucleation. In contrast, the influence of convexity on TSD generation during the final growth stage is weak, with densities remaining at 0-3 cm-2. The results indicate that the initial growth stage is the dominant period for TSD formation, mainly governed by thermal field-induced C/Si imbalance. Optimizing the thermal field to maintain a low growth front convexity is essential for suppressing TSD formation in large-diameter 4H-SiC single crystals.

Key words: 4H-SiC single crystal, threading screw dislocation, C/Si ratio, temperature gradient

CLC Number: