Rare Earth Oxide Surface Modification of Porous SiO2 Film Prepared by Atomic Layer Deposition

doi:10.15541/jim20240433

Abstract

Abstract: Broadband transparent films play a pivotal role in various applications such as lenses and solar cells, particularly porous structured transparent films that exhibit significant potential. The present study investigates a porous SiO₂ refractive index gradient anti-reflective film prepared by atomic layer deposition. A porous SiO₂ film with gradual porosity was obtained by phosphoric acid etching of Al₂O₃/SiO₂ multilayers with gradient Al₂O₃ ratios, achieving a gradual decrease in refractive index from the substrate to the surface. The film exhibited an average transmittance as high as 97.8% within the wavelength range from 320 nm to 1200 nm. The environmental adaptability of this film was further enhanced by surface modification using rare earth oxide La₂O₃, resulting in the formation of a lotus leaf-like structure and achieving a water contact angle of 100°. This modification significantly improved hydrophobic self-cleaning capability while maintaining exceptional transparency of the film. The surface structure of the modified film remained undamaged even after undergoing wipe testing, demonstrating its excellent surface durability.

Key words: porous SiO₂, rare earth oxide, atomic layer deposition, anti-reflective, self-cleaning

CLC Number:

TB43

JIN Jianfei, LÜ Lin, LI Ying, YAN Lu, CAO Yunzhen, LI Wei. Rare Earth Oxide Surface Modification of Porous SiO₂ Film Prepared by Atomic Layer Deposition[J]. Journal of Inorganic Materials, DOI: 10.15541/jim20240433.

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Rare Earth Oxide Surface Modification of Porous SiO₂ Film Prepared by Atomic Layer Deposition

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