无机材料学报

• 研究论文 • 上一篇    下一篇

NbN/TaN纳米多层膜的微结构及超高硬度效应

许俊华; 李戈扬; 顾明元   

  1. 上海交通大学金属基复合材料国家重点实验室; 上海 200030
  • 收稿日期:1999-05-07 修回日期:1999-06-17 出版日期:2000-06-20 网络出版日期:2000-06-20

Microstructures and Superhardness Effects of NbN/TaN Nano-multilayer Films

XU Jun-Hua; LI Ge-Yang; GU Ming-Yuan   

  1. State Key Lab of MMCs; Shanghai JiaD-Tong University Shanghai 200030; China
  • Received:1999-05-07 Revised:1999-06-17 Published:2000-06-20 Online:2000-06-20

摘要: 用磁控反应溅射的方法在不锈钢基片上制备了NbN/TaN纳米多层薄膜,试验采用X射线衍射仪(XRD)、透射电子显微镜(TEM)及显微硬度仪对薄膜的微结构和硬度进行分析,结果表明:在NbN/TaN多层膜中,NbN层为面心晶体结构,TaN层为六方晶体结构;NbN/TaN纳米多层膜存在超硬效应,在调制周期2.3~170nm这一放宽的范围内保持超高硬度,硬度最大值HK达51.0GPa

关键词: NbN/TaN纳米多层膜, 微结构, 超硬效应

Abstract: The polycrystalline NbN/TaN nano-multilayer films were grown on the substrates of stainless steel
by reactive magnetron sputtering. The microstructures and microhardness of the nano-multilayer films were studied by X-ray diffraction (XRD),
transmission electron microscopy (TEM) and microhardness tester. The results show that the NbN layers are cubic crystal structure and TaN layers are
hexagonal in the NbN/TaN multilayer films. NbN/TaN nano-multilayer films have superhardness effects with a modulation period from 2.3nm to 17.0nm.
The maximum hardness HK is 51.0GPa.

Key words: NbN/TaN nano-multilayer films, microstructures, superhardness effects

中图分类号: