激光化学气相沉积快速生长高取向TiNx薄膜的研究

doi:10.3724/SP.J.1077.2010.00391

无机材料学报

激光化学气相沉积快速生长高取向TiN_x薄膜的研究

公衍生¹, 涂溶², 後藤孝²

1. 中国地质大学（武汉）教育部纳米矿物材料及应用工程研究中心材料科学与化学工程学院, 武汉 430074; 2. 日本东北大学金属材料研究所, 仙台 980-8577

收稿日期:2009-07-21 修回日期:2009-09-15 出版日期:2010-04-20 网络出版日期:2010-04-27

High-speed Deposition of Oriented TiN_x Films by Laser Metalorganic Chemical Vapor Deposition

GONG Yan-Sheng ¹, TU Rong², GOTO Takashi²

1. Engineering Research Center of Nano-geomaterials of Ministry of Education, School of Materials Science and Chemical Engineering, China University of Geosciences, Wuhan 430074, China; 2. Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan

Received:2009-07-21 Revised:2009-09-15 Published:2010-04-20 Online:2010-04-27

摘要/Abstract

摘要： 采用激光化学气相沉积（LCVD）技术在氧化铝衬底上制备了高取向的TiN_x薄膜,重点研究了激光功率（PL）、衬底预热温度（T_pre）和沉积总压力（P_tot）对薄膜取向和沉积速率的影响,采用X射线衍射（XRD）、俄歇能谱（AES）和场发射扫描电镜（FESEM）对薄膜组成和结构进行了表征.结果表明：所得到的TiN_x薄膜成分均匀,其取向与衬底预热温度有关,随着预热温度的升高,TiNx薄膜的取向由（111）变为（200）,薄膜的取向与其微观结构一致.TiN_x薄膜的沉积速率随着激光功率升高而增大,在P_L=100W时,达到最大值90μm/h（沉积面积为300mm²）,显著高于采用其它方法制备的TiN_x薄膜.

关键词: TiN_x薄膜, 快速生长, 取向, 激光化学气相沉积（LCVD）

Abstract: TiN_xfilms were prepared on Al2O3 substrates by laser chemical vapor deposition (LCVD). The effects of laser power (PL), pre-heatment temperature (T_pre) and total pressure in the main chamber (P_tot) on the orientation and deposition rate (Rdep) of TiNx films were investigated. The deposited TiNx films were characterized by Xray diffraction (XRD), atomic emission spectrometry (AES) and field emission scanning electron microscope (FESEM). The results showed that the composition in TiN_x films was uniform, and the orientation was relative to the T_pre, which changed from (111) to (200) orientation with increasing T_pre. The orientation was consistent with its microstructure. The Rdep of TiNx films increased with increasing P_L, showing a maximum (90μm/h) at P_L = 100W at a deposition area of about 300mm², which was higher than that of TiN_x films prepared by other methods.

Key words: TiN_x films, highspeed deposition, orientation, laser chemical vapor deposition (LCVD)

中图分类号:

TB43
TB34

公衍生,涂溶,後藤孝. 激光化学气相沉积快速生长高取向TiN_x薄膜的研究[J]. 无机材料学报, DOI: 10.3724/SP.J.1077.2010.00391.

GONG Yan-Sheng,TU Rong,GOTO Takashi. High-speed Deposition of Oriented TiN_x Films by Laser Metalorganic Chemical Vapor Deposition[J]. Journal of Inorganic Materials, DOI: 10.3724/SP.J.1077.2010.00391.

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激光化学气相沉积快速生长高取向TiN_x薄膜的研究

High-speed Deposition of Oriented TiN_x Films by Laser Metalorganic Chemical Vapor Deposition

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激光化学气相沉积快速生长高取向TiNx薄膜的研究

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激光化学气相沉积快速生长高取向TiN_x薄膜的研究

High-speed Deposition of Oriented TiN_x Films by Laser Metalorganic Chemical Vapor Deposition