原子层沉积法制备稀土氧化物表面改性多孔SiO2薄膜

doi:10.15541/jim20240433

摘要/Abstract

摘要： 宽带增透膜在透镜和太阳能电池等领域有广泛应用,其中多孔结构增透膜表现出巨大潜力。本工作研究了一种由原子层沉积法制备的多孔SiO₂折射率梯度防反射膜。通过磷酸刻蚀Al₂O₃/SiO₂多层膜,得到具有渐变孔隙率的多孔SiO₂膜,折射率从衬底到表面逐渐降低。在320~1200 nm波长范围内,薄膜的平均透过率达97.8%。利用稀土氧化物La₂O₃表面改性,薄膜表面形成荷叶状疏水结构,水接触角100°,在保持薄膜透过率的同时显著提高疏水自清洁能力。改性薄膜在擦拭测试后未受到破坏,表明具有优异的表面耐久性,环境适应性得到明显增强。

关键词: 多孔SiO₂, 稀土氧化物, 原子层沉积, 减反射, 自清洁

Abstract: Broadband transparent films play a pivotal role in various applications such as lenses and solar cells, particularly porous structured transparent films that exhibit significant potential. The present study investigates a porous SiO₂ refractive index gradient anti-reflective film prepared by atomic layer deposition. A porous SiO₂ film with gradual porosity was obtained by phosphoric acid etching of Al₂O₃/SiO₂ multilayers with gradient Al₂O₃ ratios, achieving a gradual decrease in refractive index from the substrate to the surface. The film exhibited an average transmittance as high as 97.8% within the wavelength range from 320 nm to 1200 nm. The environmental adaptability of this film was further enhanced by surface modification using rare earth oxide La₂O₃, resulting in the formation of a lotus leaf-like structure and achieving a water contact angle of 100°. This modification significantly improved hydrophobic self-cleaning capability while maintaining exceptional transparency of the film. The surface structure of the modified film remained undamaged even after undergoing wipe testing, demonstrating its excellent surface durability.

Key words: porous SiO₂, rare earth oxide, atomic layer deposition, anti-reflective, self-cleaning

中图分类号:

TB43

金剑飞, 吕林, 李莹, 闫璐, 曹韫真, 李伟. 原子层沉积法制备稀土氧化物表面改性多孔SiO₂薄膜[J]. 无机材料学报, DOI: 10.15541/jim20240433.

JIN Jianfei, LÜ Lin, LI Ying, YAN Lu, CAO Yunzhen, LI Wei. Rare Earth Oxide Surface Modification of Porous SiO₂ Film Prepared by Atomic Layer Deposition[J]. Journal of Inorganic Materials, DOI: 10.15541/jim20240433.

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原子层沉积法制备稀土氧化物表面改性多孔SiO₂薄膜

Rare Earth Oxide Surface Modification of Porous SiO₂ Film Prepared by Atomic Layer Deposition

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