Journal of Inorganic Materials ›› 2020, Vol. 35 ›› Issue (6): 682-688.DOI: 10.15541/jim20190386

Special Issue: 【虚拟专辑】层状MAX,MXene及其他二维材料

• RESEARCH PAPER • Previous Articles     Next Articles

Size Effect on the Interface Modulation of Interlayer and Auger Recombination Rates in MoS2/WSe2 van der Waals Heterostructures

TAN Shilin,YIN Shunda,OUYANG Gang()   

  1. Key Laboratory of Low-Dimensional Quantum Structures and Quantum Control of Ministry of Education, Hunan Normal University, Changsha 410081, China
  • Received:2019-07-22 Revised:2019-08-19 Published:2020-06-20 Online:2019-09-04
  • Supported by:
    National Natural Science Foundation of China(11574080);National Natural Science Foundation of China(91833302)

Abstract:

To explore the interface engineering on the carrier recombination in two-dimensional (2D) van der Waals (vdW) heterostructures, we developed a theoretical model to address the size-dependent interlayer and Auger recombination rates in MoS2/WSe2 in terms of interface bond relaxation method and Fermi's golden rule. It is found that the Auger recombination lifetime in MoS2/WSe2 increases with increasing thickness due to the weakening of Coulomb interaction between holes and electrons, as well as the Auger recombination rate is much smaller than that of MoS2 and WSe2 units. However, when the thin h-BN layer is introduced into the MoS2/WSe2, the interlayer and Auger recombination rates show opposite trends as the h-BN thickness increases. When the thickness of h-BN reaches 9.1 nm under the condition of 1L MoS2/h-BN/1L WSe2, the Auger recombination rate approaches 5.3 ns -1. These results indicate that the relevant recombination processes can be tuned by interface and dimension. Therefore, our results provide a useful guidance for the optimal design of 2D transition metal dichalcogenides-based optoelectronic nanodevices.

Key words: MoS2, WSe2, heterostructure, intercalated insulator, interlayer recombination, Auger recombination

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