Crystal Structure and Magnetic Property of Si3N4/FePd/Si3N4 Thin Films

doi:10.15541/jim20170520

Abstract

Abstract:

Si₃N₄/FePd/Si₃N₄ trilayer films were prepared by magnetron sputtering. The effect of Si₃N₄ insert as a non-magnetic material on structure and magnetic properties of FePd films was investigated. The results show that Si₃N₄ particles distribute between the FePd nanoparticles after heat treatment, which inhibit the growth of FePd grains. Compared with pure FePd films, the grains of Si₃N₄/FePd /Si₃N₄ thin films are obviously refined. By adding Si₃N₄ insert, the crystallographic parameters c/a of FePd films decrease from 0.960 to 0.946, indicating that Si₃N₄ content could effectively promote the ordering process of FePd films and improve the coercivity and remanence ratio. The coercivity and remanence ratio are increased to 249 kA/m and 0.86, respectively. With the further increase of the annealing time at 600℃, the magnetic property of the Si₃N₄-doped FePd thin films does not decrease rapidly, and its relatively high magnetic properties maintain over a wide range of annealing time, which indicate that the thermal resistance of FePd thin films are obviously improved. Si₃N₄ insert plays a great role in promoting the magnetic properties of FePd thin films, which is significant for the development of magnetic recording film materials.

Key words: Si₃N₄/FePd/Si₃N₄, FePd film, crystal structure, magnetic properties

CLC Number:

TM27

ZHOU Xin, MA Lei, LIU Tao, GUO Yong-Bin, WANG Dao, DONG Pei-Lin. Crystal Structure and Magnetic Property of Si₃N₄/FePd/Si₃N₄ Thin Films[J]. Journal of Inorganic Materials, 2018, 33(8): 909-913.

Figures/Tables 5

Fig. 1 EDS analysis results of FePd layer

Fig. 2 XRD patterns of FePd (a) films and Si3N4/FePd/Si3N4 (b) films annealed at 600℃ for different time

Fig. 3 Grain sizes of FePd and Si3N4/FePd/Si3N4 films versus annealing time at 600℃

Fig. 4 AFM and SEM images of FePd (a, c) and Si3N4/FePd/ Si3N4 (b, d) films (a, b) As-deposited; (c, d) Annealed at 600℃ for 3 h

Fig. 5 Hysteresis loops of FePd (a) and Si3N4/FePd/Si3N4 (b) films annealed at 600℃ for different time, and the relationship between Hc, Mr/Ms and heat treatment time of FePd (c) and Si3N4/FePd/Si3N4 (d)

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Crystal Structure and Magnetic Property of Si₃N₄/FePd/Si₃N₄ Thin Films

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