Sputtering Deposition and X-ray Photoelectron Spectroscopy Study for the ZnS Thin Film

Journal of Inorganic Materials

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Sputtering Deposition and X-ray Photoelectron Spectroscopy Study for the ZnS Thin Film

ZHOU Yong-Dong¹; FANG Jia-Xiong²; LI Yan-Jin²; GONG Hai-Mei²; TANG Ding-Yuan ²

1.Physics Department of Soochow University; Suzhou 215006; China; 2. Shanghai Institute of Technical Physics; Chinese Academy of Science; Shanghai 200083; China

Received:1999-12-16 Revised:2000-02-24 Published:2000-12-20 Online:2000-12-20

Abstract

Abstract: The ZnS film was grown on HgCdTe surface by using the low-temperature ion beam sputtering technique. Zn and S elements in the sputtering ZnS film sample were studied and compared with those in the evaporating ZnS film by using X-ray photoelectron spectroscopy (XPS) technique. It is proved that the constituent elements are homogeneous, and the deposition of element Zn, S cannot be detected in the sputtering ZnS film.

Key words: ZnS, ion beam sputtering deposition technique, XPS, HgCdTe, surface anti-reflection coat

CLC Number:

O484

ZHOU Yong-Dong,FANG Jia-Xiong,LI Yan-Jin,GONG Hai-Mei,TANG Ding-Yuan. Sputtering Deposition and X-ray Photoelectron Spectroscopy Study for the ZnS Thin Film[J]. Journal of Inorganic Materials.

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Sputtering Deposition and X-ray Photoelectron Spectroscopy Study for the ZnS Thin Film

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