Abstract: The preferential orientation intensity of AlN films depends on several deposition parameters. For the
first time, the function relation formulae between the intensity of preferential orientation of the films and experimental parameters
(such as sputtering pressure, target power and the distance) were found. It is common practice to perform a number of deposition experiments by varying
the controllable parameters to determine the optimal films growth conditions. The comparison of the experimental results and computational results obtained
by using the function relation formula indicates that two results have a good agreement with each other. The foundation of these function relation formulae
is of great signification for furthermore designing of a new experimental scheme, validating an old experimental result, or preparing the good
preferential orientation films.

Key words: aluminium nitride films, experimental parameters, preferential orientation, function relation