无机材料学报 ›› 2013, Vol. 28 ›› Issue (7): 691-695.DOI: 10.3724/SP.J.1077.2013.12490 CSTR: 32189.14.SP.J.1077.2013.12490

• 研究论文 • 上一篇    下一篇

PEALD原位掺杂制备纳米TiO2-xNx光催化剂

饶志鹏, 万 军, 冯嘉恒, 李超波, 夏 洋   

  1. (中国科学院 微电子研究所, 微电子器件与集成技术重点实验室, 北京 100029)
  • 收稿日期:2012-08-10 修回日期:2012-12-10 出版日期:2013-07-20 网络出版日期:2013-06-19
  • 作者简介:饶志鹏(1985–), 男, 博士研究生. E-mail: raozhipeng@ime.ac.cn
  • 基金资助:

    国家科技重大专项(2009ZX02037-003); 中国博士后科学基金(2011M500996); 中国科学院微电子器件与集成技术重点实验室基金

Preparation of Nano-scaled TiO2-xNx Photocatalyst by PEALD in-situ Doping

RAO Zhi-Peng, WAN Jun, FENG Jia-Heng, LI Chao-Bo, XIA Yang   

  1. (Key Laboratory of Microelectronic Devices and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China)
  • Received:2012-08-10 Revised:2012-12-10 Published:2013-07-20 Online:2013-06-19
  • About author:RAO Zhi-Peng. E-mail: raozhipeng@ime.ac.cn
  • Supported by:

    National Science and Technology Major Project (2009ZX02037-003); China Postdoctoral Science Foundation (2011M500996); Opening Project of Key Laboratory of  Microelectronics Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences

摘要: 采用等离子体增强型原子层沉积(PEALD)系统原位掺杂制备了TiO2-xNx光催化剂。利用光电子能谱(XPS)、高分辨率透射电镜(HRTEM)、光致发光(PL)光谱和紫外–可见光(UV-Vis)光谱对催化剂进行了表征, 并研究了TiO2-xNx纳米薄膜在可见光照射下水接触角的变化和催化降解亚甲基橙(MO)溶液的性能。结果表明, 等离子体功率变化可以改变掺入氮原子的结构, 在功率为50 W时主要形成替换式氮原子, 含量约为1.22at%, 晶体为锐钛矿(101)型。结构无明显缺陷, 且掺杂后TiO2-xNx薄膜光生电子–空穴对复合率低, 有利于光催化效率的提高。该方法解决了传统ALD工艺制备TiO2-xNx光催化剂时容易形成氧空位的问题, 实现了TiO2-xNx纳米材料的可见光(λ<800 nm)吸收和可见光光催化性能。

关键词: 等离子体增强原子层沉积, 原位; TiO2-xNx, 光催化剂

Abstract: TiO2-xNx photocatalyst was deposited by plasma-enhanced atomic layer deposition (PEALD) system using in-situ doping method. X-ray photoelectron spectroscope (XPS), high-resolution transmission electron microscope (HRTEM), photoluminescence (PL), UV-Vis spectra were used to characterize the photocatalyst, and the variation of water contact angles and photocatalytic decomposition property of TiO2-xNx nano films to methylene orange (MO) solution under visible light were investigated. The results show that the incorporated nitrogen structures could be adjusted by plasma powers, and substitutional atoms are mainly formed in the TiO2 films deposited at the plasma power of 50 W, which is about ~1.22at%. The crystal type is anatase (101). No defect is observed in the TiO2-xNx films, and the recombination rate of the photo-generated electron-hole pairs is lower, which is conducive to the improvement of the photocatalytic efficiency. This method solves the problem of the formation of oxygen vacancies in the classic ALD growth process to prepare TiO2-xNx photocatalysts and the TiO2-xNx nano films realize visible absorption and visible light photocatalytic activity under visible light irradiation (λ<800 nm).

Key words: PEALD, in-situ; TiO2-xNx, photocatalyst

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