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无机材料学报

无机材料学报

• 研究论文 • 上一篇    

铜基体上CVD金刚石厚膜的制备

马丙现; 姚宁; 杨仕娥; 高关胤; 张兵临   

  1. 郑州大学物理工程学院 郑州 450052
  • 收稿日期:2003-06-30 修回日期:2003-07-28 出版日期:2004-07-20 网络出版日期:2004-07-20

Preparation of Thick CVD Diamond Film on Copper Substrate

MA Bing-Xian; YAO Ning; YANG Shi-E; GAO Guan-Yin; ZHANG Bing-Lin   

  1. Institute of Physics Engineering; Zhengzhou University; Zhengzhou 450052 China
  • Received:2003-06-30 Revised:2003-07-28 Published:2004-07-20 Online:2004-07-20

PDF (PC)

1215

被引次数

14

摘要： 用MWCVD方法在无预处理铜基体上获得了金刚石薄膜和厚膜。所得金刚石膜从基体上自动脱落,但形貌分析和Ramman分析表明,所得金刚石膜具有较好的质量。因此铜是制备金刚石厚膜的理想基体材料。

关键词: CVD, 金刚石厚膜, 铜基体

Abstract: Diamond thin and thick films were prepared on clean copper substrates by a MWCVD method. The films automatically come off from copper substrates owing to weak adhesion. But micrograph and Ramman spectroscopy show that the films have higher nucleation density and higher quality. These indicate that copper is an ideal substrate for the preparation of thick diamond films.

Key words: CVD, thick diamond film, copper substrate

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