Fabrication of Lithium Phosphorus Oxynitride (LiPON) Thin Films by r.f. Sputtering Coupled with Electron Cyclotron Resonance

Abstract

Abstract: Lithium Phosphorus Oxynitride (LiPON) thin films were successfully deposited by r.f. sputtering of Li₃PO₄ target coupled with electron cyclotron resonance (ECR) in
N₂ ambient. The effects of ECR powers on the composition, surface morphology, and structures of the as-deposited thin films were examined by
X-ray photoelectron spectra (XPS), scanning electron microscope (SEM), and UV-Vis spectra measurements. The results indicated that ECR power
had an influence on the growth of LiPON thin films. The optimization condition was found to be at ECR power of 200W to assist r.f. sputtering
deposition of LiPON thin films, and Li ionic conductivity was obtained to be 8.0×10^-6S/cm. Too high ECR power may be proven to destroy the
structure of the thin film, and go against the effective insertion of N into Li₃PO₄. The mechanism of N inserted into Li₃PO₄ was discussed
during r.f. sputtering process with ECR plasma assisting for the fabrication of LiPON film.

Key words: lithium phosphorus oxynitride, r.f. sputtering, electron cyclotron resonance, lithium ionic conductivity

CLC Number:

TM912

LI Chi-Lin,FU Zheng-Wen,SHU Xing-Sheng,REN Zhao-Xing. Fabrication of Lithium Phosphorus Oxynitride (LiPON) Thin Films by r.f. Sputtering Coupled with Electron Cyclotron Resonance[J]. Journal of Inorganic Materials.

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Fabrication of Lithium Phosphorus Oxynitride (LiPON) Thin Films by r.f. Sputtering Coupled with Electron Cyclotron Resonance

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