Highly Adherent Diamond Film Deposited onto WC-Co Cemented Carbide Substrate

Abstract

Abstract: Diamond films were deposited onto WC-Co cemented carbide substrate by using microwave plasma chemical vapor deposition(CVD). The effects of TiN_x interlayer introduced on
the diamond film quality and its adhesion to the substrate were investigated. The results show that by pre-depositing TiN_x interlayer in which nitrogen
concentration changes gradually, the diamond film on the cemented carbide substrate etched by acid solution has very good quality; and its critical
load measured by indentation test, is as high as 1000N.

Key words: diamond film, interlayer, nucleation density, adhesion

CLC Number:

TB43
TG135

YANG Shi-E,LU Zhan-Ling,FAN Zhi-Qin,YAO Ning,ZHANG Bing-Lin. Highly Adherent Diamond Film Deposited onto WC-Co Cemented Carbide Substrate[J]. Journal of Inorganic Materials.

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Highly Adherent Diamond Film Deposited onto WC-Co Cemented Carbide Substrate

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