无机材料学报 ›› 2017, Vol. 32 ›› Issue (11): 1141-1146.DOI: 10.15541/jim20170012 CSTR: 32189.14.10.15541/jim20170012
左亚卓, 李红, 王少雷, 杨敏, 任慕苏, 孙晋良
收稿日期:
2017-01-06
修回日期:
2017-03-21
出版日期:
2017-11-20
网络出版日期:
2017-10-20
作者简介:
左亚卓(1991-), 男, 硕士研究生. E-mail: zuoyazhuo@163.com
基金资助:
ZUO Ya-Zhuo, LI Hong, WANG Shao-Lei, YANG Min, REN Mu-Su, SUN Jin-Liang
Received:
2017-01-06
Revised:
2017-03-21
Published:
2017-11-20
Online:
2017-10-20
摘要:
将SiC纤维毡与C纤维毡交替层叠, 通过针刺工艺制备(C-SiC)f/C预制体, 采用化学气相渗透与前驱体浸渍裂解复合工艺(CVI+PIP)制备(C-SiC)f/C复合材料, 研究(C-SiC)f/C复合材料H2-O2焰烧蚀性能。利用SEM、EDS和XRD对烧蚀前后材料的微观结构和物相组成进行分析, 探讨材料抗烧蚀机理。结果表明: (C-SiC)f/C复合材料表现出更优异的耐烧蚀性能。烧蚀750 s后, (C-SiC)f/C复合材料的线烧蚀率为1.88 μm/s, 质量烧蚀率为2.16 mg/s。与C/C复合材料相比, 其线烧蚀率降低了64.5%, 质量烧蚀率降低了73.5%; SiC纤维毡在烧蚀中心区表面形成的网络状保护膜可以有效抵御高温热流对材料的破坏; 在烧蚀过渡区和烧蚀边缘区形成的熔融SiO2能够弥合材料的裂纹、孔洞等缺陷, 阻挡氧化性气氛进入材料内部, 使材料表现出优异的抗烧蚀性能。
中图分类号:
左亚卓, 李红, 王少雷, 杨敏, 任慕苏, 孙晋良. (C-SiC)f/C复合材料的烧蚀性能[J]. 无机材料学报, 2017, 32(11): 1141-1146.
ZUO Ya-Zhuo, LI Hong, WANG Shao-Lei, YANG Min, REN Mu-Su, SUN Jin-Liang. Ablation Behavior of (C-SiC)f/C Composites[J]. Journal of Inorganic Materials, 2017, 32(11): 1141-1146.
Sample | Structure | Density/ (g•cm-3) | Open porosity | Mass fraction of SiC/% |
---|---|---|---|---|
(C-SiC)f/C | CF felt/ SiCF felt | 1.80 | 8.0% | 5%-6% |
C/C | CF felt | 1.80 | 5.1% | 0 |
表1 (C-SiC)f/C复合材料与C/C复合材料基本参数
Table 1 Basic parameters of (C-SiC)f/C and C/C composites
Sample | Structure | Density/ (g•cm-3) | Open porosity | Mass fraction of SiC/% |
---|---|---|---|---|
(C-SiC)f/C | CF felt/ SiCF felt | 1.80 | 8.0% | 5%-6% |
C/C | CF felt | 1.80 | 5.1% | 0 |
图4 (C-SiC)f/C复合材料截面形貌照片和EDS谱图(插图)
Fig. 4 Cross-sectional morphologies and EDS spectrum (insert) of (C-SiC)f/C composites (a) Low magnification; (b) High magnification
Samples | Ablation time/s | Linear ablation rate/(μm·s-1) | Mass ablation rate/(mg·s-1) |
---|---|---|---|
(C-SiC)f/C | 750 | 1.88 | 2.16 |
C/C | 750 | 5.29 | 8.14 |
表2 (C-SiC)f/C与C/C复合材料的线烧蚀率与质量烧蚀率
Table 2 Linear and mass ablation rates of (C-SiC)f/C and C/C
Samples | Ablation time/s | Linear ablation rate/(μm·s-1) | Mass ablation rate/(mg·s-1) |
---|---|---|---|
(C-SiC)f/C | 750 | 1.88 | 2.16 |
C/C | 750 | 5.29 | 8.14 |
图6 (C-SiC)f/C复合材料烧蚀中心区SEM照片和EDS谱图(插图)
Fig. 6 SEM images and EDS spectrum (insert) of the ablation center zone in (C-SiC)f/C composites (a) Low magnification; (b,d) High magnification
图8 (C-SiC)f/C复合材料烧蚀边缘区不同位置SEM照片和EDS谱图(插图)
Fig. 8 SEM images and EDS spectrum (insert) of ablation marginal zone at different places in (C-SiC)f/C composites (a) Near the transitional zone; (b) Edge of the marginal zone
No. | Reaction |
---|---|
1 | SiC(s) → SiC(l) |
2 | 2/3SiC(s) + O2(g) → 2/3SiO2(s) + 2/3CO(g) 2/3SiC(s) + O2(g) → 2/3SiO2(l) + 2/3CO(g) 2/3SiC(l) + O2(g) → 2/3SiO2(g) + 2/3CO(g) |
3 | 1/2SiC(s) + O2(g) → 1/2SiO2(s) + 1/2CO2(g) 1/2SiC(s) + O2(g) → 1/2SiO2(l) + 1/2CO2(g) 1/2SiC(l) + O2(g) → 1/2SiO2(g) + 1/2CO2(g) |
4 | SiC(s) + O2(g) → SiO(g) + CO(g) |
5 | 2/3SiC(s) + O2(g) → 2/3SiO(g) + 2/3CO2(g) |
6 | SiO2(l) → SiO2(g) |
7 | SiO2(l) + CO(g) → SiO(g) + CO2(g) |
8 | SiO2(l) + C(s) → SiO(g) + CO(g) |
9 | 1/3SiO2(l) + C → 1/3SiC(s) + 2/3CO(g) 1/3SiO2(g) + C → 1/3SiC(s) + 2/3CO(g) 1/3SiO2(g) + C → 1/3SiC(l) + 2/3CO(g) |
10 | 1/2SiO2(l) + C → 1/2SiC(s) + 1/2CO2(g) 1/2SiO2(g) + C → 1/2SiC(s) + 1/2CO2(g) 1/2SiO2(g) + C → 1/2SiC(l) + 1/2CO2(g) |
11 | SiC(s) + 2SiO2(l) → 3SiO(g) + CO SiC(l) + 2SiO2(g) → 3SiO(g) + CO |
12 | C(s) + O2(g) → CO2(g) |
13 | 2C(s) + O2(g) → 2CO(g) |
14 | C(s) + H2O(g) → CO(g) + H2(g) |
表3 C和SiC在烧蚀过程中主要发生的反应
Table 3 Main reactions occured in thermo-chemical ablation process
No. | Reaction |
---|---|
1 | SiC(s) → SiC(l) |
2 | 2/3SiC(s) + O2(g) → 2/3SiO2(s) + 2/3CO(g) 2/3SiC(s) + O2(g) → 2/3SiO2(l) + 2/3CO(g) 2/3SiC(l) + O2(g) → 2/3SiO2(g) + 2/3CO(g) |
3 | 1/2SiC(s) + O2(g) → 1/2SiO2(s) + 1/2CO2(g) 1/2SiC(s) + O2(g) → 1/2SiO2(l) + 1/2CO2(g) 1/2SiC(l) + O2(g) → 1/2SiO2(g) + 1/2CO2(g) |
4 | SiC(s) + O2(g) → SiO(g) + CO(g) |
5 | 2/3SiC(s) + O2(g) → 2/3SiO(g) + 2/3CO2(g) |
6 | SiO2(l) → SiO2(g) |
7 | SiO2(l) + CO(g) → SiO(g) + CO2(g) |
8 | SiO2(l) + C(s) → SiO(g) + CO(g) |
9 | 1/3SiO2(l) + C → 1/3SiC(s) + 2/3CO(g) 1/3SiO2(g) + C → 1/3SiC(s) + 2/3CO(g) 1/3SiO2(g) + C → 1/3SiC(l) + 2/3CO(g) |
10 | 1/2SiO2(l) + C → 1/2SiC(s) + 1/2CO2(g) 1/2SiO2(g) + C → 1/2SiC(s) + 1/2CO2(g) 1/2SiO2(g) + C → 1/2SiC(l) + 1/2CO2(g) |
11 | SiC(s) + 2SiO2(l) → 3SiO(g) + CO SiC(l) + 2SiO2(g) → 3SiO(g) + CO |
12 | C(s) + O2(g) → CO2(g) |
13 | 2C(s) + O2(g) → 2CO(g) |
14 | C(s) + H2O(g) → CO(g) + H2(g) |
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